A two step process to form organothiol self-assembled monolayers on nickel surfaces

Sundar Rajalingam, Sébastien Devillers, Joseph Delhalle, Zineb Mekhalif

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Résumé

This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.

langue originaleAnglais
Pages (de - à)247-253
Nombre de pages7
journalThin Solid Films
Volume522
Les DOIs
Etat de la publicationPublié - 1 nov. 2012

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