A two step process to form organothiol self-assembled monolayers on nickel surfaces

Résultats de recherche: Contribution à un journal/une revueArticle

8 Downloads (Pure)

Résumé

This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.

langue originaleAnglais
Pages (de - à)247-253
Nombre de pages7
journalThin Solid Films
Volume522
Les DOIs
étatPublié - 1 nov. 2012

Empreinte digitale

Self assembled monolayers
Nickel
hydrazine
nickel
Nickel oxide
nickel oxides
Hydrazine
hydrazines
meteorology
assembling
Sulfhydryl Compounds
thiols
Oxides
Monolayers
Ethanol
ethyl alcohol
Oxidation
oxidation
oxides

Citer ceci

@article{fbedee01c04244fb9488958a6c95a2bc,
title = "A two step process to form organothiol self-assembled monolayers on nickel surfaces",
abstract = "This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. {\circledC} 2012 Elsevier B.V.",
keywords = "Hydrazine monohydrate, Nickel oxide reduction, Self-assembled monolayers, X-ray photoelectron spectroscopy",
author = "Sundar Rajalingam and S{\'e}bastien Devillers and Joseph Delhalle and Zineb Mekhalif",
year = "2012",
month = "11",
day = "1",
doi = "10.1016/j.tsf.2012.08.036",
language = "English",
volume = "522",
pages = "247--253",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",

}

A two step process to form organothiol self-assembled monolayers on nickel surfaces. / Rajalingam, Sundar; Devillers, Sébastien; Delhalle, Joseph; Mekhalif, Zineb.

Dans: Thin Solid Films, Vol 522, 01.11.2012, p. 247-253.

Résultats de recherche: Contribution à un journal/une revueArticle

TY - JOUR

T1 - A two step process to form organothiol self-assembled monolayers on nickel surfaces

AU - Rajalingam, Sundar

AU - Devillers, Sébastien

AU - Delhalle, Joseph

AU - Mekhalif, Zineb

PY - 2012/11/1

Y1 - 2012/11/1

N2 - This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.

AB - This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.

KW - Hydrazine monohydrate

KW - Nickel oxide reduction

KW - Self-assembled monolayers

KW - X-ray photoelectron spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=84868584532&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2012.08.036

DO - 10.1016/j.tsf.2012.08.036

M3 - Article

VL - 522

SP - 247

EP - 253

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -