A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration

Nordine Hendaoui, Aladin Mani, Ning Liu, Syed M. Tofail, Christophe Silien, André Peremans

Résultats de recherche: Contribution à un journal/une revueArticle

Résumé

A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.

langueAnglais
Pages574-579
Nombre de pages6
journalOptics Communications
Volume382
Les DOIs
étatPublié - 1 janv. 2017

Empreinte digitale

Adsorbates
standing waves
Microscopic examination
Diffraction
spatial resolution
microscopy
Infrared radiation
Imaging techniques
Computer simulation
configurations
diffraction
micrometers
methylidyne
simulation

mots-clés

    Citer ceci

    @article{898cf83f2f154154b84eea1ce299127d,
    title = "A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration",
    abstract = "A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.",
    keywords = "ATR configuration, Far field, Infrared microscopy, Label free, Super-resolution",
    author = "Nordine Hendaoui and Aladin Mani and Ning Liu and Tofail, {Syed M.} and Christophe Silien and Andr{\'e} Peremans",
    year = "2017",
    month = "1",
    day = "1",
    doi = "10.1016/j.optcom.2016.08.034",
    language = "English",
    volume = "382",
    pages = "574--579",
    journal = "Optics Communications",
    issn = "0030-4018",
    publisher = "Elsevier",

    }

    A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration. / Hendaoui, Nordine; Mani, Aladin; Liu, Ning; Tofail, Syed M.; Silien, Christophe; Peremans, André.

    Dans: Optics Communications, Vol 382, 01.01.2017, p. 574-579.

    Résultats de recherche: Contribution à un journal/une revueArticle

    TY - JOUR

    T1 - A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration

    AU - Hendaoui,Nordine

    AU - Mani,Aladin

    AU - Liu,Ning

    AU - Tofail,Syed M.

    AU - Silien,Christophe

    AU - Peremans,André

    PY - 2017/1/1

    Y1 - 2017/1/1

    N2 - A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.

    AB - A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.

    KW - ATR configuration

    KW - Far field

    KW - Infrared microscopy

    KW - Label free

    KW - Super-resolution

    UR - http://www.scopus.com/inward/record.url?scp=84983605938&partnerID=8YFLogxK

    U2 - 10.1016/j.optcom.2016.08.034

    DO - 10.1016/j.optcom.2016.08.034

    M3 - Article

    VL - 382

    SP - 574

    EP - 579

    JO - Optics Communications

    T2 - Optics Communications

    JF - Optics Communications

    SN - 0030-4018

    ER -