INIS
simulation
94%
sputtering
75%
magnetrons
75%
monte carlo method
61%
deposition
59%
growth
54%
kinetics
47%
films
47%
thin films
46%
nanostructures
44%
surfaces
42%
substrates
33%
atoms
33%
impulse
25%
power
25%
diffusion
25%
graphene
23%
copper
23%
energy
20%
modeling
20%
islands
19%
size
19%
synthesis
17%
control
16%
mechanical properties
16%
optical properties
16%
porous materials
15%
comparative evaluations
15%
coalescence
14%
plasma
14%
metals
14%
nitrogen
14%
coatings
14%
nanoparticles
13%
range
13%
shape
12%
doped materials
11%
mesh generation
11%
ripening
11%
glass
11%
fragmentation
11%
investigations
11%
layers
11%
carbon
11%
metallic glasses
11%
gases
11%
nanowires
11%
thermal properties
11%
high temperature
11%
prediction
11%
Material Science
Magnetron Sputtering
100%
Thin Films
91%
Film
88%
Optical Property
47%
Density
45%
High Power Impulse Magnetron Sputtering
41%
Film Growth
36%
Titanium Dioxide
27%
Thin Film Growth
21%
Graphene
17%
Coating Process
15%
Activation Energy
14%
Diffusivity
13%
Nanoparticle
13%
Amorphous Carbon
11%
Amorphous Metal
11%
Oxide Film
11%
Nitrogen-Doped Graphene
11%
Nanowires
11%
Nitride Compound
11%
Thermal Property
11%
Analytical Method
11%
Platinum Alloys
11%
Morphology
11%
Nanocrystalline Material
11%
Thick Films
11%
Ostwald Ripening
11%
Chromium
11%
Surface Diffusion
10%
Oxide Compound
9%
Thin Film Deposition
8%
Ab Initio Calculation
8%
Chemical Vapor Deposition
8%
Materials Property
7%
Surface Roughness
7%
Oxidation Reaction
6%
Vacuum Deposition
5%
Electron Microscopy
5%
Thin Film Structure
5%
Film Thickness
5%
Coarsening
5%
Grain Boundary
5%
ZnO
5%
Defect Density
5%
Amorphous Silicon
5%
Metallic Films
5%
Keyphrases
Deposition Flux
13%
Nitrogen-doped Graphene
11%
Patterned Si Substrates
11%
Early Stage Growth
11%
Multiscale Simulation
11%
Virtual Material
11%
Metal Fill
11%
Ti Thin Film
11%
Nanostructured Ti
11%
Glancing Angle Deposition
11%
Columnar Thin Film
11%
Finite Element Analysis
11%
Finite Element Mesh Generation
11%
Monte Carlo Prediction
11%
Frequency Effect
11%
Cycle Effect
11%
Ni(III)
11%
Cluster Assembled
11%
Chromium Nitride
11%
Atomic Simulation
11%
CoPt Alloy
11%
Embedded Atom Method
11%
Kinetic Monte Carlo
11%
Co Nanoparticles
11%
Amorphous SiO2
11%
Surface Phenomena
11%
Vein Pattern
11%
Practice-oriented
11%
Fracture Shape
11%
CuZr
11%
Thin Film Metallic Glass
11%
Multiple-scale Approach
11%
Thin Film Growth
11%
Coating Process
11%
Optical Thin Film
11%
Film Growth Simulations
11%
Magnetron Sputtering at Oblique Angle
11%
TiOx
11%
Energetic Particles
11%
Oxide Film Growth
11%
Vacuum Deposition Methods
11%
Discharge Power Density
11%
Reactive Flux
11%
Three-dimensional Lattice
11%
Oxide Thin Films
11%
Island Coalescence
11%
Atomic Deposition
11%
Monte Carlo Code
11%
Ostwald
11%
Bipolar HiPIMS
11%
