X-ray photoelectron spectroscopy characterization of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface

Roumen Vitchev, Jean-Jacques Pireaux, Thierry Conard, H. Bender, J. Wolstenholme, Chr. Defranoux

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)21-25
Number of pages5
JournalApplied Surface Science
Volume235
Publication statusPublished - 2004

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