Use of reactive sputtering model to predict working point conditions of two different TiN sputtering devices

Research output: Contribution to journalArticle

Abstract

Precise control of the reactive gas mass flow commands the properties of coatings deposited by reactive sputtering. This is especially important when one want to compare samples produced in sputtering apparatus fitted with different cathode sizes. This paper presents the use of the simple Berg's model to predict reactive sputtering mode transition with two vacuum chamber and different titanium source sizes. The TiN deposition rates measured at different N flow in a large vacuum chamber mounted with a 90 mm diameter Ti sputtering source are compared with the model prediction. From the same calculation, the transition region is predicted for an another vacuum system mounted with a 50 mm diameter cathode. This prediction is experimentally confirmed by mass spectrometry measurements of partial pressure and nitrogen concentration analysis in the coatings as function of the N flow.
Original languageEnglish
Pages (from-to)28-32
Number of pages5
Journal"Revue ""le vide : science, technique et applications"""
Volume53
Issue number284 SUPPL. 1
Publication statusPublished - 1 Apr 1997

Fingerprint Dive into the research topics of 'Use of reactive sputtering model to predict working point conditions of two different TiN sputtering devices'. Together they form a unique fingerprint.

  • Cite this