Unbalanced magnetron sputtered Si-Al coatings: plasma conditions and film properties versus sample bias voltage

Marco Jacobs, Guy Terwagne, Philippe Roquiny, Franz Bodart

Research output: Contribution to journalArticle

63 Downloads (Pure)
Original languageEnglish
Pages (from-to)735-741
Number of pages7
JournalSurface and Coatings Technology
Volume116-119
Publication statusPublished - 1999

Cite this

@article{ac5edd1e3c534f0eb0e440cc984ae6bb,
title = "Unbalanced magnetron sputtered Si-Al coatings: plasma conditions and film properties versus sample bias voltage",
author = "Marco Jacobs and Guy Terwagne and Philippe Roquiny and Franz Bodart",
note = "Publication code : **RES. ACAD.",
year = "1999",
language = "English",
volume = "116-119",
pages = "735--741",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",

}

Unbalanced magnetron sputtered Si-Al coatings : plasma conditions and film properties versus sample bias voltage. / Jacobs, Marco; Terwagne, Guy; Roquiny, Philippe; Bodart, Franz.

In: Surface and Coatings Technology, Vol. 116-119, 1999, p. 735-741.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Unbalanced magnetron sputtered Si-Al coatings

T2 - plasma conditions and film properties versus sample bias voltage

AU - Jacobs, Marco

AU - Terwagne, Guy

AU - Roquiny, Philippe

AU - Bodart, Franz

N1 - Publication code : **RES. ACAD.

PY - 1999

Y1 - 1999

M3 - Article

VL - 116-119

SP - 735

EP - 741

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -