TOF-SIMS study of organosilane adsorption on model hydroxyl terminated surfaces

L. Houssiau, Patrick Bertrand

Research output: Contribution to journalArticlepeer-review


In order to further understand organosilane oscillatory adsorption, we have adsorbed octyltrichlorosilane (CHSiCl or OS) on model hydroxyl terminated surfaces consisting of a thiol-alcohol self-assembled on gold. The adsorption kinetics was followed with the time-of-flight secondary ion mass spectrometry (TOF-SIMS) technique. The OS adsorption is readily detected by means of a variety of silicon containing ions, some non-specific (e.g. SiH, SiO) and others specific of the OS (CHSiO or dimers CHSiO). Interestingly, a complex non-monotonic adsorption pattern is observed. Moreover, carefully selected ions exhibit different intensity variations with the adsorption time, providing some insight not only on adsorption kinetics, but also on film cross-linking, adsorption sites occupation and even on HCl production due to the trichlorosilane hydrolysis. Small, non-specific fragments (SiH) are believed to indicate the OS surface coverage whereas large specific fragments are strongly dependent on the interface cross-linking, which reduces their probability of sputtering.
Original languageEnglish
Pages (from-to)580-585
Number of pages6
JournalApplied Surface Science
Publication statusPublished - 15 Jan 2003


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