Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

J.-M. Chappé, N. Martin, J. Lintymer, F. Sthal, G. Terwagne, J. Takadoum

    Research output: Contribution to journalArticlepeer-review

    1496 Downloads (Pure)

    Fingerprint

    Dive into the research topics of 'Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process'. Together they form a unique fingerprint.

    Keyphrases

    Material Science

    INIS