TEM Characterization of polysilicon and silicide fin fabrication processes of FinFETs

J. Ratajczak; A. Laszcz; A. Czerwinski; J. Katcki; Xiaohui Tang; Nicolas Reckinger; D.A. Yarekha; G. Larrieu; E. Dubois

TEM Characterization of polysilicon and silicide fin fabrication processes of FinFETs

J. Ratajczak, A. Laszcz, A. Czerwinski, J. Katcki, Xiaohui Tang, Nicolas Reckinger, D.A. Yarekha, G. Larrieu, E. Dubois

Research output: Contribution to conference › Abstract › peer-review

Original language	English
Publication status	Published - 2009
Event	3rd National Conference on Nanotechnology - Warsaw, Poland Duration: 22 Jun 2009 → 26 Jun 2009

Scientific committee

Scientific committee	3rd National Conference on Nanotechnology
Country/Territory	Poland
City	Warsaw
Period	22/06/09 → 26/06/09

Cite this

@conference{6afb754c29ae4ca6bfb2e16dea342c01,

title = "TEM Characterization of polysilicon and silicide fin fabrication processes of FinFETs",

author = "J. Ratajczak and A. Laszcz and A. Czerwinski and J. Katcki and Xiaohui Tang and Nicolas Reckinger and D.A. Yarekha and G. Larrieu and E. Dubois",

year = "2009",

language = "English",

note = "3rd National Conference on Nanotechnology ; Conference date: 22-06-2009 Through 26-06-2009",

}

TY - CONF

T1 - TEM Characterization of polysilicon and silicide fin fabrication processes of FinFETs

AU - Ratajczak, J.

AU - Laszcz, A.

AU - Czerwinski, A.

AU - Katcki, J.

AU - Tang, Xiaohui

AU - Reckinger, Nicolas

AU - Yarekha, D.A.

AU - Larrieu, G.

AU - Dubois, E.

PY - 2009

Y1 - 2009

M3 - Abstract

T2 - 3rd National Conference on Nanotechnology

Y2 - 22 June 2009 through 26 June 2009

ER -