Study of the Pd-Rh interdiffusion by ToF-SIMS, RBS and PIXE: Semi-quantitative depth profiles with MCs+ clusters

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Abstract

In this paper, ToF-SIMS was used to study the Pd-Rh interdiffusion which has a great interest in brachytherapy, a cancer treatment. The secondary ion mass spectrometry was used in the semi-quantitative MCs mode, by detecting the RhCs and the PdCs molecular ions under cesium bombardment. At first, different RhPd (from pure Rh to pure Pd) layers were deposited by PVD and were subsequently characterized by ToF-SIMS, RBS and PIXE. A linear relationship between the relative CsPd yields and the Pd concentration into the Rh matrices was found. Moreover, the total sputtering yield increases linearly with the Pd concentration. Those relationships permitted to calibrate the ToF-SIMS depth profiles of annealed Pd/Rh layers and were successfully used to quantify the Pd-Rh interdiffusion.
Original languageEnglish
Pages (from-to)7038-7040
Number of pages3
JournalApplied Surface Science
Volume252
Issue number19
DOIs
Publication statusPublished - 30 Jul 2006

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Secondary ion mass spectrometry
Cesium
Oncology
Physical vapor deposition
Sputtering
Ions

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@article{1690c5d7ff76422b9bf2908be9fa6d1a,
title = "Study of the Pd-Rh interdiffusion by ToF-SIMS, RBS and PIXE: Semi-quantitative depth profiles with MCs+ clusters",
abstract = "In this paper, ToF-SIMS was used to study the Pd-Rh interdiffusion which has a great interest in brachytherapy, a cancer treatment. The secondary ion mass spectrometry was used in the semi-quantitative MCs mode, by detecting the RhCs and the PdCs molecular ions under cesium bombardment. At first, different RhPd (from pure Rh to pure Pd) layers were deposited by PVD and were subsequently characterized by ToF-SIMS, RBS and PIXE. A linear relationship between the relative CsPd yields and the Pd concentration into the Rh matrices was found. Moreover, the total sputtering yield increases linearly with the Pd concentration. Those relationships permitted to calibrate the ToF-SIMS depth profiles of annealed Pd/Rh layers and were successfully used to quantify the Pd-Rh interdiffusion.",
author = "J. Brison and R. Hubert and S. Lucas and L. Houssiau",
year = "2006",
month = "7",
day = "30",
doi = "10.1016/j.apsusc.2006.02.185",
language = "English",
volume = "252",
pages = "7038--7040",
journal = "Appl. Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "19",

}

TY - JOUR

T1 - Study of the Pd-Rh interdiffusion by ToF-SIMS, RBS and PIXE

T2 - Semi-quantitative depth profiles with MCs+ clusters

AU - Brison, J.

AU - Hubert, R.

AU - Lucas, S.

AU - Houssiau, L.

PY - 2006/7/30

Y1 - 2006/7/30

N2 - In this paper, ToF-SIMS was used to study the Pd-Rh interdiffusion which has a great interest in brachytherapy, a cancer treatment. The secondary ion mass spectrometry was used in the semi-quantitative MCs mode, by detecting the RhCs and the PdCs molecular ions under cesium bombardment. At first, different RhPd (from pure Rh to pure Pd) layers were deposited by PVD and were subsequently characterized by ToF-SIMS, RBS and PIXE. A linear relationship between the relative CsPd yields and the Pd concentration into the Rh matrices was found. Moreover, the total sputtering yield increases linearly with the Pd concentration. Those relationships permitted to calibrate the ToF-SIMS depth profiles of annealed Pd/Rh layers and were successfully used to quantify the Pd-Rh interdiffusion.

AB - In this paper, ToF-SIMS was used to study the Pd-Rh interdiffusion which has a great interest in brachytherapy, a cancer treatment. The secondary ion mass spectrometry was used in the semi-quantitative MCs mode, by detecting the RhCs and the PdCs molecular ions under cesium bombardment. At first, different RhPd (from pure Rh to pure Pd) layers were deposited by PVD and were subsequently characterized by ToF-SIMS, RBS and PIXE. A linear relationship between the relative CsPd yields and the Pd concentration into the Rh matrices was found. Moreover, the total sputtering yield increases linearly with the Pd concentration. Those relationships permitted to calibrate the ToF-SIMS depth profiles of annealed Pd/Rh layers and were successfully used to quantify the Pd-Rh interdiffusion.

UR - http://www.scopus.com/inward/record.url?scp=33747166179&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2006.02.185

DO - 10.1016/j.apsusc.2006.02.185

M3 - Article

VL - 252

SP - 7038

EP - 7040

JO - Appl. Surface Science

JF - Appl. Surface Science

SN - 0169-4332

IS - 19

ER -