Study of surface oxidation and recovery of clean MoTe2 films

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Abstract

Transporting the sample through different characterization units while maintaining its integrity is crucial if multiple surface sensitive probes are to be employed. In this context, the layered transition metal dichalcogenides (TMDs) are known to be extremely susceptible to ambient degradation, leading to the formation of protrusions and particles on the films. Compared to MoS2 and MoSe2, MoTe2 is one of the most reactive surfaces to ambient conditions. Therefore, understanding its surface oxidation and how to recover a clean surface is very important. In this paper, we report the MBE synthesis of single phase of 2H-MoTe2 with good stoichiometric films on graphene terminated 6H-SiC(0001) substrates and are able to recover the clean surface after exposure to air under properly protected conditions. Our films are analyzed in detail by reflection high energy electron diffraction (RHEED), X-ray photoemission spectroscopy (XPS), and scanning tunneling microscopy (STM).

Original languageEnglish
Article number101681
JournalSurfaces and Interfaces
Volume28
DOIs
Publication statusPublished - Feb 2022

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