TY - JOUR
T1 - Single source precursor vs. precursor mixture for N-rich plasma polymer deposition: Plasma diagnostics and thin film analyses
AU - Buddhadasa, Madhuwanthi
AU - Vandenabeele, Cédric
AU - Girard-Lauriault, Pierre Luc
AU - Snyders, Rony
N1 - Publisher Copyright:
© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.
PY - 2017/5/15
Y1 - 2017/5/15
N2 - Two distinct methods of producing N-rich films, that mainly differ in their choice of precursor are compared; the first method involves a single source precursor and the second, a mixture of precursors that consists of a heteroatom source gas and hydrocarbon (HC) gas. Plasma diagnostics and thin film chemistry of allylamine (AA), cyclopropylamine (CPA), ammonia/ethylene (AmEt) and ammonia/1,3-butadiene (AmBu) are studied, while maintaining the same N to C ratio, 1 to 3, in the gas phase. Single source precursors produce films containing higher N, whereas, precursor mixtures, owing to reduced dehydrogenation, produce films with a low nitrile content. While similarities between fragmentation patterns of single source precursors and precursor mixtures are observed in the plasma phase as the energy supplied is increased, chemical differences still exist between films produced by these two methods, within the studied range of power.
AB - Two distinct methods of producing N-rich films, that mainly differ in their choice of precursor are compared; the first method involves a single source precursor and the second, a mixture of precursors that consists of a heteroatom source gas and hydrocarbon (HC) gas. Plasma diagnostics and thin film chemistry of allylamine (AA), cyclopropylamine (CPA), ammonia/ethylene (AmEt) and ammonia/1,3-butadiene (AmBu) are studied, while maintaining the same N to C ratio, 1 to 3, in the gas phase. Single source precursors produce films containing higher N, whereas, precursor mixtures, owing to reduced dehydrogenation, produce films with a low nitrile content. While similarities between fragmentation patterns of single source precursors and precursor mixtures are observed in the plasma phase as the energy supplied is increased, chemical differences still exist between films produced by these two methods, within the studied range of power.
KW - FT-IR
KW - N-rich plasma polymer films
KW - XPS
KW - mass spectrometry
KW - plasma diagnostics
UR - http://onlinelibrary.wiley.com/doi/10.1002/ppap.201700030/abstract
UR - http://www.scopus.com/inward/record.url?scp=85021744475&partnerID=8YFLogxK
U2 - 10.1002/ppap.201700030
DO - 10.1002/ppap.201700030
M3 - Article
SN - 1612-8850
VL - 14
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
IS - 11
M1 - 1700030
ER -