Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties

Research output: Contribution to conferencePoster

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Abstract

In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions.
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
Original languageEnglish
Number of pages1
Publication statusUnpublished - 2018
EventPLASMA DIAGNOSTICS AND MODELLING WORKSHOP
: TOWARDS THE INDUSTRIAL APPLICATIONS OF PLASMA-BASED PROCESSES
- Mons, Mons, Belgium
Duration: 7 Feb 20188 Feb 2018
http://www.dm2018.eu/

Symposium

SymposiumPLASMA DIAGNOSTICS AND MODELLING WORKSHOP
Abbreviated titleDM
CountryBelgium
CityMons
Period7/02/188/02/18
Internet address

Fingerprint

oxide films
magnetron sputtering
optical properties
evaluation
vacuum deposition
simulation
energetic particles
projectiles
energy distribution
angular distribution
sputtering
energy transfer
oxides
kinetics
thin films
atoms
ions

Keywords

  • simulations
  • film growth
  • reactive magnetron sputtering
  • kinetic Monte Carlo

Cite this

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title = "Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties",
abstract = "In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions. Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.",
keywords = "simulations, film growth, reactive magnetron sputtering, kinetic Monte Carlo",
author = "Romain Tonneau and Pavel Moskovkin and St{\'e}phane Lucas",
year = "2018",
language = "English",
note = "null ; Conference date: 07-02-2018 Through 08-02-2018",
url = "http://www.dm2018.eu/",

}

Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties. / Tonneau, Romain; Moskovkin, Pavel; Lucas, Stéphane (Supervisor).

2018. Poster session presented at PLASMA DIAGNOSTICS AND MODELLING WORKSHOP
, Mons, Belgium.

Research output: Contribution to conferencePoster

TY - CONF

T1 - Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties

AU - Tonneau, Romain

AU - Moskovkin, Pavel

A2 - Lucas, Stéphane

PY - 2018

Y1 - 2018

N2 - In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions. Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.

AB - In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions. Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.

KW - simulations

KW - film growth

KW - reactive magnetron sputtering

KW - kinetic Monte Carlo

M3 - Poster

ER -