Abstract
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
| Original language | English |
|---|---|
| Number of pages | 1 |
| Publication status | Unpublished - 2018 |
| Event | PLASMA DIAGNOSTICS AND MODELLING WORKSHOP : TOWARDS THE INDUSTRIAL APPLICATIONS OF PLASMA-BASED PROCESSES - Mons, Mons, Belgium Duration: 7 Feb 2018 → 8 Feb 2018 http://www.dm2018.eu/ |
Symposium
| Symposium | PLASMA DIAGNOSTICS AND MODELLING WORKSHOP |
|---|---|
| Abbreviated title | DM |
| Country | Belgium |
| City | Mons |
| Period | 7/02/18 → 8/02/18 |
| Internet address |
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Keywords
- simulations
- film growth
- reactive magnetron sputtering
- kinetic Monte Carlo
Cite this
, Mons, Belgium.
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Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties. / Tonneau, Romain; Moskovkin, Pavel; Lucas, Stéphane (Supervisor).
2018. Poster session presented at PLASMA DIAGNOSTICS AND MODELLING WORKSHOP, Mons, Belgium.
Research output: Contribution to conference › Poster
TY - CONF
T1 - Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties
AU - Tonneau, Romain
AU - Moskovkin, Pavel
A2 - Lucas, Stéphane
PY - 2018
Y1 - 2018
N2 - In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions. Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
AB - In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions. Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
KW - simulations
KW - film growth
KW - reactive magnetron sputtering
KW - kinetic Monte Carlo
M3 - Poster
ER -
, Mons, Belgium.