Activities per year
Abstract
In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions.
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
| Original language | English |
|---|---|
| Number of pages | 1 |
| Publication status | Unpublished - 2018 |
| Event | PLASMA DIAGNOSTICS AND MODELLING WORKSHOP : TOWARDS THE INDUSTRIAL APPLICATIONS OF PLASMA-BASED PROCESSES - Mons, Mons, Belgium Duration: 7 Feb 2018 → 8 Feb 2018 http://www.dm2018.eu/ |
Symposium
| Symposium | PLASMA DIAGNOSTICS AND MODELLING WORKSHOP |
|---|---|
| Abbreviated title | DM |
| Country | Belgium |
| City | Mons |
| Period | 7/02/18 → 8/02/18 |
| Internet address |
Keywords
- simulations
- film growth
- reactive magnetron sputtering
- kinetic Monte Carlo
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Activities
- 1 Participation in conference
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11th Asian-European International Conference on Plasma Surface Engineering
Stéphane Lucas (Invited Speaker)
11 Sep 2017 → 15 Sep 2017Activity: Participating in or organising an event types › Participation in conference