Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties

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Abstract

In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions.
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
Original languageEnglish
Number of pages1
Publication statusUnpublished - 2018
EventPLASMA DIAGNOSTICS AND MODELLING WORKSHOP
: TOWARDS THE INDUSTRIAL APPLICATIONS OF PLASMA-BASED PROCESSES
- Mons, Mons, Belgium
Duration: 7 Feb 20188 Feb 2018
http://www.dm2018.eu/

Symposium

SymposiumPLASMA DIAGNOSTICS AND MODELLING WORKSHOP
Abbreviated titleDM
CountryBelgium
CityMons
Period7/02/188/02/18
Internet address

Keywords

  • simulations
  • film growth
  • reactive magnetron sputtering
  • kinetic Monte Carlo

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  • Activities

    • 1 Participation in conference

    11th Asian-European International Conference on Plasma Surface Engineering

    Stéphane Lucas (Invited Speaker)

    11 Sep 201715 Sep 2017

    Activity: Participating in or organising an event typesParticipation in conference

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