Sealing of porous low-k dielectric materials : UV-03 oxidised CVD silicon oxy carbide films

Sealing of porous low-k dielectric materials : UV-0₃ oxidised CVD silicon oxy carbide films

Caroline Whelan, Francesca Cecchet, Toan Le, Alessandra Satta, Jean-Jacques Pireaux, Karen Maex, Petra Rudolf

Research output: Contribution to journal › Article › peer-review

@article{4343fa8ba2f94d55a268e29759036c87,

title = "Sealing of porous low-k dielectric materials : UV-03 oxidised CVD silicon oxy carbide films",

author = "Caroline Whelan and Francesca Cecchet and Toan Le and Alessandra Satta and Jean-Jacques Pireaux and Karen Maex and Petra Rudolf",

year = "2002",

language = "English",

volume = "24",

pages = "201--210",

journal = "Physicalia. Mag. ",

number = "3",

}

TY - JOUR

T1 - Sealing of porous low-k dielectric materials : UV-03 oxidised CVD silicon oxy carbide films

AU - Whelan, Caroline

AU - Cecchet, Francesca

AU - Le, Toan

AU - Satta, Alessandra

AU - Pireaux, Jean-Jacques

AU - Maex, Karen

AU - Rudolf, Petra

PY - 2002

Y1 - 2002

M3 - Article

VL - 24

SP - 201

EP - 210

JO - Physicalia. Mag.

JF - Physicalia. Mag.

IS - 3

ER -