RNRA and neutron threshold analyses of thick lithium coatings deposited by sputter evaporation

Christophe Rigaux, R. Vigneron, F. Bodart, Y. Jongen, A. Cambriani, S. Lucas

Research output: Contribution to journalArticle

Abstract

Li coatings on various substrates have numerous applications: Boron neutron capture therapy, super conducting tokamak, etc. Unfortunately the main difficulty using Li is its reactivity in air and diffusion into metals. It is the only metal that reacts with nitrogen at room temperature and it tarnishes and oxidizes rapidly in air. In this work, we investigate how to profile thick Li layers (50 μm) deposited on SiO substrates by a method based on plasma sputtering, involving both DC sputtering and evaporation simultaneously. A thick Li layer (≈10 μm) was covered with a thin stainless steel layer to prevent oxidation during transfer of the sample from the sputtering chamber and the accelerator. Li coatings were investigated by RNRA and neutron threshold reaction to obtain interdiffusion profiles of the different components and their concentration. The depth profile using the Li(p,γ) Be resonance nuclear reaction occurring at 440 keV allows us to obtain Li concentration versus depth up to 50 μm. Preliminary results indicate that homogeneous Li layers can be obtained and protected against air, even though it diffuses into the encapsulated layers. © 2008.
Original languageEnglish
Pages (from-to)2446-2449
Number of pages4
JournalNuclear instruments and methods in physics research. B
Volume266
Issue number10
DOIs
Publication statusPublished - 1 May 2008

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Sputtering
Neutrons
Evaporation
Lithium
lithium
evaporation
coatings
neutrons
Coatings
thresholds
Air
sputtering
Nuclear reactions
Substrates
Metals
air
profiles
Particle accelerators
Boron
Stainless steel

Cite this

@article{eed9b3609e164d4b8a02a66b47f5f832,
title = "RNRA and neutron threshold analyses of thick lithium coatings deposited by sputter evaporation",
abstract = "Li coatings on various substrates have numerous applications: Boron neutron capture therapy, super conducting tokamak, etc. Unfortunately the main difficulty using Li is its reactivity in air and diffusion into metals. It is the only metal that reacts with nitrogen at room temperature and it tarnishes and oxidizes rapidly in air. In this work, we investigate how to profile thick Li layers (50 μm) deposited on SiO substrates by a method based on plasma sputtering, involving both DC sputtering and evaporation simultaneously. A thick Li layer (≈10 μm) was covered with a thin stainless steel layer to prevent oxidation during transfer of the sample from the sputtering chamber and the accelerator. Li coatings were investigated by RNRA and neutron threshold reaction to obtain interdiffusion profiles of the different components and their concentration. The depth profile using the Li(p,γ) Be resonance nuclear reaction occurring at 440 keV allows us to obtain Li concentration versus depth up to 50 μm. Preliminary results indicate that homogeneous Li layers can be obtained and protected against air, even though it diffuses into the encapsulated layers. {\circledC} 2008.",
author = "Christophe Rigaux and R. Vigneron and F. Bodart and Y. Jongen and A. Cambriani and S. Lucas",
note = "Publication code : RES. ACAD.",
year = "2008",
month = "5",
day = "1",
doi = "10.1016/j.nimb.2008.03.018",
language = "English",
volume = "266",
pages = "2446--2449",
journal = "Nuclear Instruments and Methods in Physical Research B",
issn = "0168-583X",
publisher = "Elsevier",
number = "10",

}

TY - JOUR

T1 - RNRA and neutron threshold analyses of thick lithium coatings deposited by sputter evaporation

AU - Rigaux, Christophe

AU - Vigneron, R.

AU - Bodart, F.

AU - Jongen, Y.

AU - Cambriani, A.

AU - Lucas, S.

N1 - Publication code : RES. ACAD.

PY - 2008/5/1

Y1 - 2008/5/1

N2 - Li coatings on various substrates have numerous applications: Boron neutron capture therapy, super conducting tokamak, etc. Unfortunately the main difficulty using Li is its reactivity in air and diffusion into metals. It is the only metal that reacts with nitrogen at room temperature and it tarnishes and oxidizes rapidly in air. In this work, we investigate how to profile thick Li layers (50 μm) deposited on SiO substrates by a method based on plasma sputtering, involving both DC sputtering and evaporation simultaneously. A thick Li layer (≈10 μm) was covered with a thin stainless steel layer to prevent oxidation during transfer of the sample from the sputtering chamber and the accelerator. Li coatings were investigated by RNRA and neutron threshold reaction to obtain interdiffusion profiles of the different components and their concentration. The depth profile using the Li(p,γ) Be resonance nuclear reaction occurring at 440 keV allows us to obtain Li concentration versus depth up to 50 μm. Preliminary results indicate that homogeneous Li layers can be obtained and protected against air, even though it diffuses into the encapsulated layers. © 2008.

AB - Li coatings on various substrates have numerous applications: Boron neutron capture therapy, super conducting tokamak, etc. Unfortunately the main difficulty using Li is its reactivity in air and diffusion into metals. It is the only metal that reacts with nitrogen at room temperature and it tarnishes and oxidizes rapidly in air. In this work, we investigate how to profile thick Li layers (50 μm) deposited on SiO substrates by a method based on plasma sputtering, involving both DC sputtering and evaporation simultaneously. A thick Li layer (≈10 μm) was covered with a thin stainless steel layer to prevent oxidation during transfer of the sample from the sputtering chamber and the accelerator. Li coatings were investigated by RNRA and neutron threshold reaction to obtain interdiffusion profiles of the different components and their concentration. The depth profile using the Li(p,γ) Be resonance nuclear reaction occurring at 440 keV allows us to obtain Li concentration versus depth up to 50 μm. Preliminary results indicate that homogeneous Li layers can be obtained and protected against air, even though it diffuses into the encapsulated layers. © 2008.

UR - http://www.scopus.com/inward/record.url?scp=46549086937&partnerID=8YFLogxK

U2 - 10.1016/j.nimb.2008.03.018

DO - 10.1016/j.nimb.2008.03.018

M3 - Article

VL - 266

SP - 2446

EP - 2449

JO - Nuclear Instruments and Methods in Physical Research B

JF - Nuclear Instruments and Methods in Physical Research B

SN - 0168-583X

IS - 10

ER -