Removal of plasma-modified low-k layer using dilute HF: influence of concentration

Q.T. LE, M.R. BAKLANOV, E. KESTERS, Ammar Azioune, H. STRUYF, W. BOULLART, Jean-Jacques Pireaux, S. VANHAELEMEERSCH

Research output: Contribution to journal › Article

Original language	English
Pages (from-to)	F21-F24
Journal	Electrochemical and Solid State Letters
Volume	8
Issue number	7
Publication status	Published - 2005

Cite this

@article{1b62e42575134a3bb64c0eb1d6ed432f,

title = "Removal of plasma-modified low-k layer using dilute HF: influence of concentration",

author = "Q.T. LE and M.R. BAKLANOV and E. KESTERS and Ammar Azioune and H. STRUYF and W. BOULLART and Jean-Jacques Pireaux and S. VANHAELEMEERSCH",

year = "2005",

language = "English",

volume = "8",

pages = "F21--F24",

journal = "Electrochemical and Solid State Letters",

number = "7",

}

TY - JOUR

T1 - Removal of plasma-modified low-k layer using dilute HF: influence of concentration

AU - LE, Q.T.

AU - BAKLANOV, M.R.

AU - KESTERS, E.

AU - Azioune, Ammar

AU - STRUYF, H.

AU - BOULLART, W.

AU - Pireaux, Jean-Jacques

AU - VANHAELEMEERSCH, S.

PY - 2005

Y1 - 2005

M3 - Article

VL - 8

SP - F21-F24

JO - Electrochemical and Solid State Letters

JF - Electrochemical and Solid State Letters

IS - 7

ER -