Process and apparatus for coating a substrate

Pierre Vanden Brande, (Inventor), Stephane Lucas, (Inventor), Alain Weymeersch, (Inventor)

    Research output: Patent

    Abstract

    In forming a coating of an element, especially a metal, on a substrate moving through an evaporation chamber, the novelty is that (a) the chamber is equipped with a target which has a substrate-facing surface layer containing the element; (b) the coating is formed by vapour deposition and simultaneous cathodic sputtering of the element from the target; and (c) the ratio of the amounts of evaporated and sputtered element is regulated by the energy supply to the target. Also claimed is a coating apparatus especially for carrying out the above process, the apparatus having (i) a chamber (3) equipped with a target (4) having a surface layer (5) facing the substrate (1) and containing one or more of the elements of the coating (2); (ii) a transport system for moving the substrate (1) preferably continuously past the target (4); (iii) a heat regulating system (9) for holding the surface layer (5) optionally in the liquid state and for controlled evaporation of the element; and (iv) a system (6, 8, 10, 11) for cathodic sputtering of the element from the target (4) towards the substrate (1).
    Translated title of the contributionProcédé et dispositif pour la formation d'un revêtement sur un substrat
    Original languageEnglish
    Patent numberEP0780486
    IPCC23C 14/ 56 A I
    Priority date20/12/95
    Publication statusPublished - 25 Jun 1997

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  • Cite this

    Vanden Brande, P., Lucas, S., & Weymeersch, A. (1997). IPC No. C23C 14/ 56 A I. Process and apparatus for coating a substrate. (Patent No. EP0780486).