Plasma fluorination of vertically aligned carbon nanotubes: functionalization and thermal stability

Claudia Struzzi, Mattia Scardamaglia, Axel Hemberg, Luca Petaccia, Jean-François Colomer, Rony Snyders, Carla Bittencourt

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    Abstract

    Grafting of fluorine species on carbon nanostructures has attracted interest due to the effective modification of physical and
    chem-
    ical properties of the starting materials. Various techniques have been employed to achieve a controlled fluorination yield; however,
    the effect of contaminants is rarely discussed, although they are often present. In the present work, the fluorination of vertically
    aligned multiwalled carbon nanotubes was performed using plasma treatment in a magnetron sputtering chamber with fluorine
    diluted in an argon atmosphere with an
    Ar/F
    2
    ratio of 95:5. The effect of heavily diluted fluorine in the precursor gas mixture is
    investigated by evaluating the modifications in the nanotube structure and the electronic properties upon plasma treatment. The
    existence of oxygen-based grafted species is associated with background oxygen species present in the plasma chamber in addition
    to fluorine. The thermal stability and desorption process of the fluorine species grafted on the carbon nanotubes during the fluorine
    plasma treatment were evaluated by combining different spectroscopic techniques.
    Original languageEnglish
    Pages (from-to)2263 - 2271
    JournalBeilstein Journal of Nanotechnology
    Volume6
    Publication statusPublished - 2015

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