Physical characterization of mixed HfAlOx layers by complementary analysis techniques

H. Bender; Th. Conard; O. Richard; B. Brijs; J. Pétry; W. Vandervorst; C. Defranoux; P. Boher; N. Rochat; C. Wyon; P. Mack; J. Wolstenholme; R. Vitchev; L. Houssiau; J.-J. Pireaux; A. Bergmaier; G. Dollinger

doi:10.1016/j.mseb.2003.10.118

Physical characterization of mixed HfAlO_x layers by complementary analysis techniques

H. Bender, Th. Conard, O. Richard, B. Brijs, J. Pétry, W. Vandervorst, C. Defranoux, P. Boher, N. Rochat, C. Wyon, P. Mack, J. Wolstenholme, R. Vitchev, L. Houssiau, J.-J. Pireaux, A. Bergmaier, G. Dollinger

Namur Research Institute for Life Sciences

Research output: Contribution to journal › Article › peer-review

Abstract

The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.

Original language	English
Pages (from-to)	60-63
Number of pages	4
Journal	Materials science and engineering. B
Volume	109
Issue number	1-3
DOIs	https://doi.org/10.1016/j.mseb.2003.10.118
Publication status	Published - 15 Jun 2004

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Bender, H., Conard, T., Richard, O., Brijs, B., Pétry, J., Vandervorst, W., Defranoux, C., Boher, P., Rochat, N., Wyon, C., Mack, P., Wolstenholme, J., Vitchev, R., Houssiau, L., Pireaux, J-J., Bergmaier, A., & Dollinger, G. (2004). Physical characterization of mixed HfAlO_x layers by complementary analysis techniques. Materials science and engineering. B, 109(1-3), 60-63. https://doi.org/10.1016/j.mseb.2003.10.118

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Bender, H, Conard, T, Richard, O, Brijs, B, Pétry, J, Vandervorst, W, Defranoux, C, Boher, P, Rochat, N, Wyon, C, Mack, P, Wolstenholme, J, Vitchev, R, Houssiau, L , Pireaux, J-J, Bergmaier, A & Dollinger, G 2004, 'Physical characterization of mixed HfAlO_x layers by complementary analysis techniques', Materials science and engineering. B, vol. 109, no. 1-3, pp. 60-63. https://doi.org/10.1016/j.mseb.2003.10.118

TY - JOUR

T1 - Physical characterization of mixed HfAlOx layers by complementary analysis techniques

AU - Bender, H.

AU - Conard, Th.

AU - Richard, O.

AU - Brijs, B.

AU - Pétry, J.

AU - Vandervorst, W.

AU - Defranoux, C.

AU - Boher, P.

AU - Rochat, N.

AU - Wyon, C.

AU - Mack, P.

AU - Wolstenholme, J.

AU - Vitchev, R.

AU - Houssiau, L.

AU - Pireaux, J.-J.

AU - Bergmaier, A.

AU - Dollinger, G.

PY - 2004/6/15

Y1 - 2004/6/15

N2 - The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.

AB - The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.

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ER -

Physical characterization of mixed HfAlO_x layers by complementary analysis techniques

Abstract

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