Physical characterization of mixed HfAlOx layers by complementary analysis techniques

H. Bender, Th. Conard, O. Richard, B. Brijs, J. Pétry, W. Vandervorst, C. Defranoux, P. Boher, N. Rochat, C. Wyon, P. Mack, J. Wolstenholme, R. Vitchev, L. Houssiau, J.-J. Pireaux, A. Bergmaier, G. Dollinger

Research output: Contribution to journalArticlepeer-review

Abstract

The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.
Original languageEnglish
Pages (from-to)60-63
Number of pages4
JournalMaterials science and engineering. B
Volume109
Issue number1-3
DOIs
Publication statusPublished - 15 Jun 2004

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