Oxygen Partial Pressure and Annealing Temperature Effects on the formation of Sputtered WO3 Films

Carla Bittencourt Papaleo Montes, R. Landers, E. Llobet, X. Correig, J. Calderer

Research output: Contribution to journal › Article

Original language	English
Journal	Semiconductor Science and Technology
Volume	7
Publication status	Published - 2002

Cite this

@article{5198a0d841454cf481455582f645b95f,

title = "Oxygen Partial Pressure and Annealing Temperature Effects on the formation of Sputtered WO3 Films",

author = "{Bittencourt Papaleo Montes}, Carla and R. Landers and E. Llobet and X. Correig and J. Calderer",

year = "2002",

language = "English",

volume = "7",

journal = "Semiconductor Science and Technology ",

issn = "1361-6641",

publisher = "IOP Publishing Ltd.",

}