TY - JOUR
T1 - Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles
AU - Shaw, Santosh
AU - Miller, Kyle J.
AU - Colaux, Julien L.
AU - Cademartiri, Ludovico
PY - 2016/7/1
Y1 - 2016/7/1
N2 - We describe a lithographic approach - nanocrystal plasma polymerization-based lithography - in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist.
AB - We describe a lithographic approach - nanocrystal plasma polymerization-based lithography - in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist.
KW - colloids nanoparticles
KW - inorganic photoresists
KW - low-cost and rapid
KW - optics-free lithography
KW - plasma
KW - self-assembly
UR - http://www.scopus.com/inward/record.url?scp=84986300573&partnerID=8YFLogxK
U2 - 10.1117/1.JMM.15.3.031607
DO - 10.1117/1.JMM.15.3.031607
M3 - Article
AN - SCOPUS:84986300573
SN - 1932-5150
VL - 15
JO - Journal of Micro/ Nanolithography, MEMS, and MOEMS
JF - Journal of Micro/ Nanolithography, MEMS, and MOEMS
IS - 3
M1 - 031607
ER -