We describe a lithographic approach - Nanocrystal Plasma Polymerization (NPP)-based lithography (Figure 1) - where colloidal nanocrystal assemblies (CNAs) are used as the resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs are redispersed leaving behind the patterned area.
|Title of host publication||Advances in Patterning Materials and Processes XXXIII|
|Publication status||Published - 2016|
|Event||Advances in Patterning Materials and Processes XXXIII - San Jose, United States|
Duration: 22 Feb 2016 → 25 Feb 2016
|Conference||Advances in Patterning Materials and Processes XXXIII|
|Period||22/02/16 → 25/02/16|
- Nanocrystal plasma polymerization