Optics-free lithography on colloidal nanocrystal assemblies

Santosh Shaw, Kyle J. Miller, Julien L. Colaux, Ludovico Cademartiri

Research output: Contribution in Book/Catalog/Report/Conference proceedingConference contribution

Abstract

We describe a lithographic approach - Nanocrystal Plasma Polymerization (NPP)-based lithography (Figure 1) - where colloidal nanocrystal assemblies (CNAs) are used as the resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs are redispersed leaving behind the patterned area.

Original languageEnglish
Title of host publicationAdvances in Patterning Materials and Processes XXXIII
PublisherSPIE
Volume9779
ISBN (Electronic)9781510600140
DOIs
Publication statusPublished - 2016
Externally publishedYes
EventAdvances in Patterning Materials and Processes XXXIII - San Jose, United States
Duration: 22 Feb 201625 Feb 2016

Conference

ConferenceAdvances in Patterning Materials and Processes XXXIII
CountryUnited States
CitySan Jose
Period22/02/1625/02/16

Keywords

  • Colloids
  • Lithography
  • Nanocrystal plasma polymerization
  • Nanoparticles
  • Optics-free
  • Plasma
  • Self-assembly

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  • Cite this

    Shaw, S., Miller, K. J., Colaux, J. L., & Cademartiri, L. (2016). Optics-free lithography on colloidal nanocrystal assemblies. In Advances in Patterning Materials and Processes XXXIII (Vol. 9779). [97791J] SPIE. https://doi.org/10.1117/12.2218792