Multitechnique characterisation of Al2O3 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

Laurent Houssiau, Roumen Vitchev, Jean-Jacques Pireaux, Thierry Conard, H. Bender, O. Richard, P. Mack, J. Wolstenholme, Chr. Defranoux

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)36-38
Number of pages3
JournalProceedings of the AVS Fourth International Conference on Microelectronics and Interfaces
Publication statusPublished - 2003

Cite this