Original language | English |
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Pages (from-to) | 36-38 |
Number of pages | 3 |
Journal | Proceedings of the AVS Fourth International Conference on Microelectronics and Interfaces |
Publication status | Published - 2003 |
Multitechnique characterisation of Al2O3 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition
Laurent Houssiau, Roumen Vitchev, Jean-Jacques Pireaux, Thierry Conard, H. Bender, O. Richard, P. Mack, J. Wolstenholme, Chr. Defranoux
Research output: Contribution to journal › Article