Method and apparatus for cleaning a metal substrate

Pierre Vanden Brande, (Inventor), Stephane Lucas, (Inventor), Alain Weymeersch, (Inventor)

    Research output: Patent

    Abstract

    A metal substrate cleaning process comprises: creating a plasma in a mixture of hydrogen, hydrogen compounds and/or inert gas (e.g. argon) to generate radicals and/or ions for acting on the substrate which is negatively biased with respect to an anode facing the surface to be cleaned. Also claimed is a metal substrate cleaning apparatus, especially for carrying out the above process, comprising devices for generating a plasma and negatively biasing the substrate surface.
    Translated title of the contributionProcédé et dispositif pour le décapage d'un substrat métallique
    Original languageEnglish
    Patent numberEP0780485
    IPCC23G 5/ 00 A I
    Priority date20/12/95
    Publication statusPublished - 25 Jun 1997

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