Method and apparatus for cleaning a metal substrate

Pierre Vanden Brande,; Stephane Lucas,; Alain Weymeersch,

Method and apparatus for cleaning a metal substrate

Pierre Vanden Brande, (Inventor), Stephane Lucas, (Inventor), Alain Weymeersch, (Inventor)

Research output: Patent

Abstract

A metal substrate cleaning process comprises: creating a plasma in a mixture of hydrogen, hydrogen compounds and/or inert gas (e.g. argon) to generate radicals and/or ions for acting on the substrate which is negatively biased with respect to an anode facing the surface to be cleaned. Also claimed is a metal substrate cleaning apparatus, especially for carrying out the above process, comprising devices for generating a plasma and negatively biasing the substrate surface.

Translated title of the contribution	Procédé et dispositif pour le décapage d'un substrat métallique
Original language	English
Patent number	EP0780485
IPC	C23G 5/ 00 A I
Priority date	20/12/95
Publication status	Published - 25 Jun 1997

Embargoed Document

EP-780485
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title = "Method and apparatus for cleaning a metal substrate",

abstract = "A metal substrate cleaning process comprises: creating a plasma in a mixture of hydrogen, hydrogen compounds and/or inert gas (e.g. argon) to generate radicals and/or ions for acting on the substrate which is negatively biased with respect to an anode facing the surface to be cleaned. Also claimed is a metal substrate cleaning apparatus, especially for carrying out the above process, comprising devices for generating a plasma and negatively biasing the substrate surface.",

author = "{Vanden Brande,}, Pierre and Stephane Lucas, and Alain Weymeersch,",

year = "1997",

month = jun,

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language = "English",

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note = "EP0780485; C23G 5/ 00 A I",

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TY - PAT

T1 - Method and apparatus for cleaning a metal substrate

AU - Vanden Brande,, Pierre

AU - Lucas,, Stephane

AU - Weymeersch,, Alain

PY - 1997/6/25

Y1 - 1997/6/25

N2 - A metal substrate cleaning process comprises: creating a plasma in a mixture of hydrogen, hydrogen compounds and/or inert gas (e.g. argon) to generate radicals and/or ions for acting on the substrate which is negatively biased with respect to an anode facing the surface to be cleaned. Also claimed is a metal substrate cleaning apparatus, especially for carrying out the above process, comprising devices for generating a plasma and negatively biasing the substrate surface.

AB - A metal substrate cleaning process comprises: creating a plasma in a mixture of hydrogen, hydrogen compounds and/or inert gas (e.g. argon) to generate radicals and/or ions for acting on the substrate which is negatively biased with respect to an anode facing the surface to be cleaned. Also claimed is a metal substrate cleaning apparatus, especially for carrying out the above process, comprising devices for generating a plasma and negatively biasing the substrate surface.

M3 - Patent

M1 - EP0780485

ER -

Method and apparatus for cleaning a metal substrate

Abstract

Embargoed Document

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