Metallic source/drain for advanced MOS architectures: from material engineering to device integration

E. Dubois, G. Larrieu, N. Breil, R. Valentin, F. Danneville, D.A. Yarekha, C. Krzeminski, E Lampin, J.-M. Droulez, Nicolas Reckinger, Xiaohui Tang, A. Halimaoui, R. Rengel, E. Pascual, A. Pouydebasque, X. Wallart, SYLVIE GODEY, J. Ratajczak, A. Laszcz, J. KatckiJean-Pierre Raskin, G Dambrine, A Cros, T. Skotnicki

    Research output: Contribution to conferenceAbstract

    Original languageEnglish
    Publication statusPublished - 2009
    EventSINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices - Athènes, Greece
    Duration: 18 Sep 2009 → …

    Scientific committee

    Scientific committeeSINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices
    CountryGreece
    CityAthènes
    Period18/09/09 → …

    Cite this