Metallic source/drain for advanced MOS architectures: from material engineering to device integration

E. Dubois, G. Larrieu, N. Breil, R. Valentin, F. Danneville, D.A. Yarekha, C. Krzeminski, E Lampin, J.-M. Droulez, Nicolas Reckinger, Xiaohui Tang, A. Halimaoui, R. Rengel, E. Pascual, A. Pouydebasque, X. Wallart, SYLVIE GODEY, J. Ratajczak, A. Laszcz, J. Katcki & 4 others Jean-Pierre Raskin, G Dambrine, A Cros, T. Skotnicki

Research output: ResearchAbstract

Scientific committee

Scientific committeeSINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices
CountryGreece
CityAthènes
Period18/09/09 → …

Cite this

Dubois, E., Larrieu, G., Breil, N., Valentin, R., Danneville, F., Yarekha, D. A., ... Skotnicki, T. (2009). Metallic source/drain for advanced MOS architectures: from material engineering to device integration. Abstract from SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Greece.
Dubois, E. ; Larrieu, G. ; Breil, N. ; Valentin, R. ; Danneville, F. ; Yarekha, D.A. ; Krzeminski, C. ; Lampin, E ; Droulez, J.-M. ; Reckinger, Nicolas ; Tang, Xiaohui ; Halimaoui, A. ; Rengel, R. ; Pascual, E. ; Pouydebasque, A. ; Wallart, X. ; GODEY, SYLVIE ; Ratajczak, J. ; Laszcz, A. ; Katcki, J. ; Raskin, Jean-Pierre ; Dambrine, G ; Cros, A ; Skotnicki, T./ Metallic source/drain for advanced MOS architectures: from material engineering to device integration. Abstract from SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Greece.
@conference{f4ef5a98a6594a2a800562da507ca792,
title = "Metallic source/drain for advanced MOS architectures: from material engineering to device integration",
author = "E. Dubois and G. Larrieu and N. Breil and R. Valentin and F. Danneville and D.A. Yarekha and C. Krzeminski and E Lampin and J.-M. Droulez and Nicolas Reckinger and Xiaohui Tang and A. Halimaoui and R. Rengel and E. Pascual and A. Pouydebasque and X. Wallart and SYLVIE GODEY and J. Ratajczak and A. Laszcz and J. Katcki and Jean-Pierre Raskin and G Dambrine and A Cros and T. Skotnicki",
year = "2009",

}

Dubois, E, Larrieu, G, Breil, N, Valentin, R, Danneville, F, Yarekha, DA, Krzeminski, C, Lampin, E, Droulez, J-M, Reckinger, N, Tang, X, Halimaoui, A, Rengel, R, Pascual, E, Pouydebasque, A, Wallart, X, GODEY, SYLVIE, Ratajczak, J, Laszcz, A, Katcki, J, Raskin, J-P, Dambrine, G, Cros, A & Skotnicki, T 2009, 'Metallic source/drain for advanced MOS architectures: from material engineering to device integration' SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Greece, 18/09/09, .

Metallic source/drain for advanced MOS architectures: from material engineering to device integration. / Dubois, E.; Larrieu, G.; Breil, N.; Valentin, R.; Danneville, F.; Yarekha, D.A.; Krzeminski, C.; Lampin, E; Droulez, J.-M.; Reckinger, Nicolas; Tang, Xiaohui; Halimaoui, A.; Rengel, R.; Pascual, E.; Pouydebasque, A.; Wallart, X.; GODEY, SYLVIE; Ratajczak, J.; Laszcz, A.; Katcki, J.; Raskin, Jean-Pierre ; Dambrine, G; Cros, A; Skotnicki, T.

2009. Abstract from SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Greece.

Research output: ResearchAbstract

TY - CONF

T1 - Metallic source/drain for advanced MOS architectures: from material engineering to device integration

AU - Dubois,E.

AU - Larrieu,G.

AU - Breil,N.

AU - Valentin,R.

AU - Danneville,F.

AU - Yarekha,D.A.

AU - Krzeminski,C.

AU - Lampin,E

AU - Droulez,J.-M.

AU - Reckinger,Nicolas

AU - Tang,Xiaohui

AU - Halimaoui,A.

AU - Rengel,R.

AU - Pascual,E.

AU - Pouydebasque,A.

AU - Wallart,X.

AU - GODEY,SYLVIE

AU - Ratajczak,J.

AU - Laszcz,A.

AU - Katcki,J.

AU - Raskin,Jean-Pierre

AU - Dambrine,G

AU - Cros,A

AU - Skotnicki,T.

PY - 2009

Y1 - 2009

M3 - Abstract

ER -

Dubois E, Larrieu G, Breil N, Valentin R, Danneville F, Yarekha DA et al. Metallic source/drain for advanced MOS architectures: from material engineering to device integration. 2009. Abstract from SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Greece.