Dubois, E, Larrieu, G, Breil, N, Valentin, R, Danneville, F, Yarekha, DA, Krzeminski, C, Lampin, E, Droulez, J-M
, Reckinger, N, Tang, X, Halimaoui, A, Rengel, R, Pascual, E, Pouydebasque, A, Wallart, X, GODEY, SYLVIE, Ratajczak, J, Laszcz, A, Katcki, J, Raskin, J-P, Dambrine, G, Cros, A & Skotnicki, T 2009, '
Metallic source/drain for advanced MOS architectures: from material engineering to device integration', SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Greece,
18/09/09.