Metallic source/drain for advanced MOS architectures: from material engineering to device integration

E. Dubois, G. Larrieu, N. Breil, R. Valentin, F. Danneville, D.A. Yarekha, C. Krzeminski, E Lampin, J.-M. Droulez, Nicolas Reckinger, Xiaohui Tang, A. Halimaoui, R. Rengel, E. Pascual, A. Pouydebasque, X. Wallart, SYLVIE GODEY, J. Ratajczak, A. Laszcz, J. KatckiJean-Pierre Raskin, G Dambrine, A Cros, T. Skotnicki

Research output: Contribution to conferenceAbstract

Original languageEnglish
Publication statusPublished - 2009
EventSINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices - Athènes, Greece
Duration: 18 Sep 2009 → …

Scientific committee

Scientific committeeSINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices
CountryGreece
CityAthènes
Period18/09/09 → …

Cite this

Dubois, E., Larrieu, G., Breil, N., Valentin, R., Danneville, F., Yarekha, D. A., ... Skotnicki, T. (2009). Metallic source/drain for advanced MOS architectures: from material engineering to device integration. Abstract from SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Greece.