Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering

Pavel Moskovkin, Christian Maszl, Roland Schierholz, Wolfgang Breilmann, Jan Petersen, Andreas Phlug, Jerome Muller, Mohsin Raza, Stephanos Konstantinidis, Aachim von Keudell, Stephane Lucas

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Engineering

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