LEEIXS and XPS studies of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air

Said Agouram, Franz Bodart, Guy Terwagne

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Abstract

Chromium oxynitride thin films were deposited onto polished carbon substrates by an unbalanced magnetron sputtering in a reactive atmosphere of argon and air with different relative humidities (concentrations of water vapor). The composition and thickness of chromium oxynitride thin films were measured by ion beam techniques such as: Rutherford backscattering spectroscopy (RBS) and resonant nuclear reaction analysis (RNRA). The nitrogen and hydrogen profiles were determined by RNRA and Tof-SIMS, the chemical bond analysis was carried out by low energy electron induced X-ray spectroscopy (LEEIXS) and X-ray photoemission spectroscopy (XPS). The LEEIX spectroscopic studies analysis have shown that, during metallic sputtering mode, the composition of Cr---N---O can be fitted only by Cr2O3 with low content of CrN and CrO2, and in the compound sputtering mode the CrO2 stoichiometry predominates in the presence of low content of CrN. XPS results have also indicated the existence of another compound with (CrO2)3'N stoichiometry.
Original languageEnglish
Pages (from-to)173-181
Number of pages9
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume134
Publication statusPublished - 2004

Fingerprint

oxynitrides
Chromium
Photoelectron spectroscopy
X ray spectroscopy
chromium
photoelectric emission
Nuclear reactions
electron energy
Stoichiometry
Thin films
Sputtering
Electrons
air
thin films
Air
nuclear reactions
spectroscopy
stoichiometry
Earth atmosphere
x rays

Keywords

  • XPS
  • Chromium oxynitride
  • LEEIXS

Cite this

@article{3a7d5458e37543b4813a2ca469f02161,
title = "LEEIXS and XPS studies of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air",
abstract = "Chromium oxynitride thin films were deposited onto polished carbon substrates by an unbalanced magnetron sputtering in a reactive atmosphere of argon and air with different relative humidities (concentrations of water vapor). The composition and thickness of chromium oxynitride thin films were measured by ion beam techniques such as: Rutherford backscattering spectroscopy (RBS) and resonant nuclear reaction analysis (RNRA). The nitrogen and hydrogen profiles were determined by RNRA and Tof-SIMS, the chemical bond analysis was carried out by low energy electron induced X-ray spectroscopy (LEEIXS) and X-ray photoemission spectroscopy (XPS). The LEEIX spectroscopic studies analysis have shown that, during metallic sputtering mode, the composition of Cr---N---O can be fitted only by Cr2O3 with low content of CrN and CrO2, and in the compound sputtering mode the CrO2 stoichiometry predominates in the presence of low content of CrN. XPS results have also indicated the existence of another compound with (CrO2)3'N stoichiometry.",
keywords = "XPS , Chromium oxynitride, LEEIXS",
author = "Said Agouram and Franz Bodart and Guy Terwagne",
note = "Publication code : **RES. ACAD.",
year = "2004",
language = "English",
volume = "134",
pages = "173--181",
journal = "Journal of Electron Spectroscopy and Related Phenomena",
issn = "0368-2048",
publisher = "Elsevier",

}

TY - JOUR

T1 - LEEIXS and XPS studies of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air

AU - Agouram, Said

AU - Bodart, Franz

AU - Terwagne, Guy

N1 - Publication code : **RES. ACAD.

PY - 2004

Y1 - 2004

N2 - Chromium oxynitride thin films were deposited onto polished carbon substrates by an unbalanced magnetron sputtering in a reactive atmosphere of argon and air with different relative humidities (concentrations of water vapor). The composition and thickness of chromium oxynitride thin films were measured by ion beam techniques such as: Rutherford backscattering spectroscopy (RBS) and resonant nuclear reaction analysis (RNRA). The nitrogen and hydrogen profiles were determined by RNRA and Tof-SIMS, the chemical bond analysis was carried out by low energy electron induced X-ray spectroscopy (LEEIXS) and X-ray photoemission spectroscopy (XPS). The LEEIX spectroscopic studies analysis have shown that, during metallic sputtering mode, the composition of Cr---N---O can be fitted only by Cr2O3 with low content of CrN and CrO2, and in the compound sputtering mode the CrO2 stoichiometry predominates in the presence of low content of CrN. XPS results have also indicated the existence of another compound with (CrO2)3'N stoichiometry.

AB - Chromium oxynitride thin films were deposited onto polished carbon substrates by an unbalanced magnetron sputtering in a reactive atmosphere of argon and air with different relative humidities (concentrations of water vapor). The composition and thickness of chromium oxynitride thin films were measured by ion beam techniques such as: Rutherford backscattering spectroscopy (RBS) and resonant nuclear reaction analysis (RNRA). The nitrogen and hydrogen profiles were determined by RNRA and Tof-SIMS, the chemical bond analysis was carried out by low energy electron induced X-ray spectroscopy (LEEIXS) and X-ray photoemission spectroscopy (XPS). The LEEIX spectroscopic studies analysis have shown that, during metallic sputtering mode, the composition of Cr---N---O can be fitted only by Cr2O3 with low content of CrN and CrO2, and in the compound sputtering mode the CrO2 stoichiometry predominates in the presence of low content of CrN. XPS results have also indicated the existence of another compound with (CrO2)3'N stoichiometry.

KW - XPS

KW - Chromium oxynitride

KW - LEEIXS

M3 - Article

VL - 134

SP - 173

EP - 181

JO - Journal of Electron Spectroscopy and Related Phenomena

JF - Journal of Electron Spectroscopy and Related Phenomena

SN - 0368-2048

ER -