Issues associated to rare earth silicide integration in ultra thin FD SOI Schottky barrier nMOSFETs

G. Larrieu, D.A. Yarekha, Emmanuel Dubois, N. Breil, Nicolas Reckinger, Xiaohui Tang, A. Halimaoui

    Research output: Contribution to conferenceAbstractpeer-review

    Original languageEnglish
    Publication statusPublished - 2009
    Event215th Electrochemical Society Meeting - San Francisco, United States
    Duration: 24 May 200929 May 2009

    Scientific committee

    Scientific committee215th Electrochemical Society Meeting
    CountryUnited States
    CitySan Francisco

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