Inter-diffusion study of rhodium and tantalum by RBS

V.E. Nuttens, R.L. Hubert, F. Bodart, S. Lucas

Research output: Contribution to journalArticlepeer-review


The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)425-428
Number of pages4
JournalNuclear Instruments and Methods in Physics Research B- Beam interactions with material and atoms
Issue number1-2
Publication statusPublished - 2005


  • Diffusion barrier; High temperature; Rh; RBS

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