The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.
|Number of pages||4|
|Journal||Nuclear Instruments and Methods in Physics Research B- Beam interactions with material and atoms|
|Publication status||Published - 2005|
- Diffusion barrier; High temperature; Rh; RBS
Technological Platform Synthesis, Irradiation and Analysis of Materials
Facility/equipment: Technological Platform