Inter-diffusion study of rhodium and tantalum by RBS

V.E. Nuttens, R.L. Hubert, F. Bodart, S. Lucas

Research output: Contribution to journalArticle

Abstract

The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)425-428
Number of pages4
JournalNuclear Instruments and Methods in Physics Research B- Beam interactions with material and atoms
Volume240
Issue number1-2
DOIs
Publication statusPublished - 2005

Keywords

  • Diffusion barrier; High temperature; Rh; RBS

Fingerprint Dive into the research topics of 'Inter-diffusion study of rhodium and tantalum by RBS'. Together they form a unique fingerprint.

  • Equipment

  • Cite this