Abstract
The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.
Original language | English |
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Pages (from-to) | 425-428 |
Number of pages | 4 |
Journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
Volume | 240 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 2005 |
Keywords
- Diffusion barrier; High temperature; Rh; RBS
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Synthesis, Irradiation and Analysis of Materials (SIAM)
Pierre Louette (Manager), Julien Colaux (Manager), Alexandre Felten (Manager), Tijani Tabarrant (Operator), Frederic COME (Operator) & Paul-Louis Debarsy (Manager)
Technological Platform Synthesis, Irradiation and Analysis of MaterialsFacility/equipment: Technological Platform