Inter-diffusion study of rhodium and tantalum by RBS

Research output: Contribution to journalArticle

Abstract

The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)425-428
Number of pages4
JournalNuclear Instruments and Methods in Physics Research B- Beam interactions with material and atoms
Volume240
Issue number1-2
DOIs
Publication statusPublished - 2005

Fingerprint

Tantalum
Rhodium
tantalum
rhodium
High temperature applications
Diffusion barriers
Vacuum
Temperature
vacuum
temperature
profiles

Keywords

  • Diffusion barrier; High temperature; Rh; RBS

Cite this

@article{45c7ec492df64a0fa094d659f1bb5c8c,
title = "Inter-diffusion study of rhodium and tantalum by RBS",
abstract = "The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. {\circledC} 2005 Elsevier B.V. All rights reserved.",
keywords = "Diffusion barrier; High temperature; Rh; RBS",
author = "V.E. Nuttens and R.L. Hubert and F. Bodart and S. Lucas",
note = "Publication code : **RES. ACAD.",
year = "2005",
doi = "10.1016/j.nimb.2005.06.139",
language = "English",
volume = "240",
pages = "425--428",
journal = "Nuclear Instruments and Methods in Physical Research B",
issn = "0168-583X",
publisher = "Elsevier",
number = "1-2",

}

TY - JOUR

T1 - Inter-diffusion study of rhodium and tantalum by RBS

AU - Nuttens, V.E.

AU - Hubert, R.L.

AU - Bodart, F.

AU - Lucas, S.

N1 - Publication code : **RES. ACAD.

PY - 2005

Y1 - 2005

N2 - The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.

AB - The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.

KW - Diffusion barrier; High temperature; Rh; RBS

UR - http://www.scopus.com/inward/record.url?scp=27344435052&partnerID=8YFLogxK

U2 - 10.1016/j.nimb.2005.06.139

DO - 10.1016/j.nimb.2005.06.139

M3 - Article

VL - 240

SP - 425

EP - 428

JO - Nuclear Instruments and Methods in Physical Research B

JF - Nuclear Instruments and Methods in Physical Research B

SN - 0168-583X

IS - 1-2

ER -