Integration of low Schottky barrier source/drain for advanced MOS technology

Emmanuel Dubois, G. Larrieu, C. Krzeminski, X. Baie, Xiaohui Tang, Nicolas Reckinger, Vincent Bayot, E Robilliart, B. Froment, J. Ka̧tcki

    Research output: Contribution to conferenceAbstract

    Original languageEnglish
    Publication statusPublished - 2004
    EventIntegration of low Schottky barrier source/drain for advanced MOS technology - Athènes, Greece
    Duration: 4 Feb 20046 Feb 2004

    Scientific committee

    Scientific committeeIntegration of low Schottky barrier source/drain for advanced MOS technology
    Country/TerritoryGreece
    CityAthènes
    Period4/02/046/02/04

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