Influence of oxygen co-implantation on germanium out-diffusion and nanoclustering in SiO2/Si films

Adrien Nelis, Emile Haye, Guy Terwagne (Supervisor)

Research output: Contribution to journal › Article › peer-review

96 Downloads (Pure)

Fingerprint

Dive into the research topics of 'Influence of oxygen co-implantation on germanium out-diffusion and nanoclustering in SiO2/Si films'. Together they form a unique fingerprint.

INIS

Medicine and Dentistry

Engineering

Keyphrases

Material Science

Chemistry