Hydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality

S.R. KASI, Michael Liehr, Paul Thiry, Hervé DALLAPORTA, Michael OFFENBERG

    Research output: Contribution to journalArticle

    Original languageEnglish
    Pages (from-to)108-110
    Number of pages3
    JournalApplied Physics Letters
    Volume59
    Issue number1
    Publication statusPublished - 1991

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