Original language | English |
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Pages (from-to) | 108-110 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 59 |
Issue number | 1 |
Publication status | Published - 1991 |
Hydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality
S.R. KASI, Michael Liehr, Paul Thiry, Hervé DALLAPORTA, Michael OFFENBERG
Research output: Contribution to journal › Article