High performance of 3D silicon nanowires array@CrN for electrochemical capacitors

Abdelouadoud Guerra, Emile Haye, Amine Achour, Maxime Harnois, Toufik Hadjersi, Jean François Colomer, Jean Jacques Pireaux, Stéphane Lucas, Rabah Boukherroub

Research output: Contribution to journalArticle

Abstract

Silicon nanowire (SiNW) arrays were coated with chromium nitride (CrN) for use as supercapacitor electrodes. The CrN layer of different thicknesses was deposited onto SiNWs using bipolar magnetron sputtering method. The areal capacitance of the SiNWs-CrN, as measured in 0.5 M H2SO4 electrolyte, was as high as 180 mF cm-2 at a scan rate of 5 mV s-1 (equivalent to 31.8 mF cm-2 at 1.6 mA cm-2) with an excellent electrochemical retention of 92% over 15 000 cycles. This work paves the way toward using CrN modified 3D SiNWs arrays for micro-supercapacitor application.

Original languageEnglish
Article number035407
Pages (from-to)035407
Number of pages8
JournalNanotechnology
Volume31
Issue number3
DOIs
Publication statusPublished - 17 Jan 2020

Keywords

  • Chromium nitride
  • Electrochemical capacitors
  • Silicon nanowires
  • Transition metal nitrides
  • Vapor liquid solid method

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