High performance of 3D silicon nanowires array@CrN for electrochemical capacitors

Abdelouadoud Guerra, Emile Haye, Amine Achour, Maxime Harnois, Toufik Hadjersi, Jean François Colomer, Jean Jacques Pireaux, Stéphane Lucas, Rabah Boukherroub

Research output: Contribution to journalArticle

Abstract

Silicon nanowire (SiNW) arrays were coated with chromium nitride (CrN) for use as supercapacitor electrodes. The CrN layer of different thicknesses was deposited onto SiNWs using bipolar magnetron sputtering method. The areal capacitance of the SiNWs-CrN, as measured in 0.5 M H2SO4 electrolyte, was as high as 180 mF cm-2 at a scan rate of 5 mV s-1 (equivalent to 31.8 mF cm-2 at 1.6 mA cm-2) with an excellent electrochemical retention of 92% over 15 000 cycles. This work paves the way toward using CrN modified 3D SiNWs arrays for micro-supercapacitor application.

Original languageEnglish
Pages (from-to)035407
Number of pages8
JournalNanotechnology
Volume31
Issue number3
DOIs
Publication statusPublished - 17 Jan 2020

Fingerprint

Chromium
Silicon
Nitrides
Nanowires
Capacitors
Magnetron sputtering
Electrolytes
Capacitance
Electrodes
Supercapacitor

Cite this

@article{6d568b1c74e147c28eb81fb6b70db398,
title = "High performance of 3D silicon nanowires array@CrN for electrochemical capacitors",
abstract = "Silicon nanowire (SiNW) arrays were coated with chromium nitride (CrN) for use as supercapacitor electrodes. The CrN layer of different thicknesses was deposited onto SiNWs using bipolar magnetron sputtering method. The areal capacitance of the SiNWs-CrN, as measured in 0.5 M H2SO4 electrolyte, was as high as 180 mF cm-2 at a scan rate of 5 mV s-1 (equivalent to 31.8 mF cm-2 at 1.6 mA cm-2) with an excellent electrochemical retention of 92{\%} over 15 000 cycles. This work paves the way toward using CrN modified 3D SiNWs arrays for micro-supercapacitor application.",
author = "Abdelouadoud Guerra and Emile Haye and Amine Achour and Maxime Harnois and Toufik Hadjersi and Colomer, {Jean Fran{\cc}ois} and Pireaux, {Jean Jacques} and St{\'e}phane Lucas and Rabah Boukherroub",
year = "2020",
month = "1",
day = "17",
doi = "10.1088/1361-6528/ab4963",
language = "English",
volume = "31",
pages = "035407",
journal = "Nanotechnology",
issn = "0957-4484",
publisher = "IOP Publishing Ltd.",
number = "3",

}

High performance of 3D silicon nanowires array@CrN for electrochemical capacitors. / Guerra, Abdelouadoud; Haye, Emile; Achour, Amine; Harnois, Maxime; Hadjersi, Toufik; Colomer, Jean François; Pireaux, Jean Jacques; Lucas, Stéphane; Boukherroub, Rabah.

In: Nanotechnology, Vol. 31, No. 3, 17.01.2020, p. 035407.

Research output: Contribution to journalArticle

TY - JOUR

T1 - High performance of 3D silicon nanowires array@CrN for electrochemical capacitors

AU - Guerra, Abdelouadoud

AU - Haye, Emile

AU - Achour, Amine

AU - Harnois, Maxime

AU - Hadjersi, Toufik

AU - Colomer, Jean François

AU - Pireaux, Jean Jacques

AU - Lucas, Stéphane

AU - Boukherroub, Rabah

PY - 2020/1/17

Y1 - 2020/1/17

N2 - Silicon nanowire (SiNW) arrays were coated with chromium nitride (CrN) for use as supercapacitor electrodes. The CrN layer of different thicknesses was deposited onto SiNWs using bipolar magnetron sputtering method. The areal capacitance of the SiNWs-CrN, as measured in 0.5 M H2SO4 electrolyte, was as high as 180 mF cm-2 at a scan rate of 5 mV s-1 (equivalent to 31.8 mF cm-2 at 1.6 mA cm-2) with an excellent electrochemical retention of 92% over 15 000 cycles. This work paves the way toward using CrN modified 3D SiNWs arrays for micro-supercapacitor application.

AB - Silicon nanowire (SiNW) arrays were coated with chromium nitride (CrN) for use as supercapacitor electrodes. The CrN layer of different thicknesses was deposited onto SiNWs using bipolar magnetron sputtering method. The areal capacitance of the SiNWs-CrN, as measured in 0.5 M H2SO4 electrolyte, was as high as 180 mF cm-2 at a scan rate of 5 mV s-1 (equivalent to 31.8 mF cm-2 at 1.6 mA cm-2) with an excellent electrochemical retention of 92% over 15 000 cycles. This work paves the way toward using CrN modified 3D SiNWs arrays for micro-supercapacitor application.

UR - http://www.scopus.com/inward/record.url?scp=85073644305&partnerID=8YFLogxK

U2 - 10.1088/1361-6528/ab4963

DO - 10.1088/1361-6528/ab4963

M3 - Article

C2 - 31569088

AN - SCOPUS:85073644305

VL - 31

SP - 035407

JO - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 3

ER -