Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Said Agouram; Guy Terwagne; Franz Bodart

Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Said Agouram, Guy Terwagne, Franz Bodart (Collaborator)

Research output: Contribution in Book/Catalog/Report/Conference proceeding › Chapter (peer-reviewed) › peer-review

Original language	English
Title of host publication	Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications
Editors	eBooks Bentham
Pages	133-162
Number of pages	30
ISBN (Electronic)	978-1-60805-157-4
Publication status	Published - 2013

Synthesis, Irradiation and Analysis of Materials (SIAM)
Pierre Louette (Manager), Julien Colaux (Manager), Alexandre Felten (Manager), Tijani Tabarrant (Operator), Frederic COME (Operator) & Paul-Louis Debarsy (Manager)
Technological Platform Synthesis, Irradiation and Analysis of Materials
Facility/equipment: Technological Platform

Cite this

Agouram, Said ; Terwagne, Guy ; Bodart, Franz. / Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. editor / eBooks Bentham. 2013. pp. 133-162

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title = "Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas",

author = "Said Agouram and Guy Terwagne and Franz Bodart",

year = "2013",

language = "English",

isbn = "978-1-60805-157-1",

pages = "133--162",

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booktitle = "Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications",

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Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. / Agouram, Said; Terwagne, Guy; Bodart, Franz (Collaborator).
Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. ed. / eBooks Bentham. 2013. p. 133-162.

Research output: Contribution in Book/Catalog/Report/Conference proceeding › Chapter (peer-reviewed) › peer-review

TY - CHAP

T1 - Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

AU - Agouram, Said

AU - Terwagne, Guy

A2 - Bodart, Franz

A2 - Bentham, eBooks

PY - 2013

Y1 - 2013

M3 - Chapter (peer-reviewed)

SN - 978-1-60805-157-1

SP - 133

EP - 162

BT - Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications

ER -

Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Equipment

Synthesis, Irradiation and Analysis of Materials (SIAM)

Cite this