Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Said Agouram, Guy Terwagne, Franz Bodart (Collaborator)

Research output: Contribution in Book/Catalog/Report/Conference proceedingChapter (peer-reviewed)

Original languageEnglish
Title of host publicationMetallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications
EditorseBooks Bentham
Pages133-162
Number of pages30
ISBN (Electronic)978-1-60805-157-4
Publication statusPublished - 2013

Cite this

Agouram, S., Terwagne, G., & Bodart, F. (2013). Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. In EB. Bentham (Ed.), Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications (pp. 133-162)
Agouram, Said ; Terwagne, Guy ; Bodart, Franz. / Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. editor / eBooks Bentham. 2013. pp. 133-162
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Agouram, S, Terwagne, G & Bodart, F 2013, Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. in EB Bentham (ed.), Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. pp. 133-162.

Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. / Agouram, Said; Terwagne, Guy; Bodart, Franz (Collaborator).

Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. ed. / eBooks Bentham. 2013. p. 133-162.

Research output: Contribution in Book/Catalog/Report/Conference proceedingChapter (peer-reviewed)

TY - CHAP

T1 - Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

AU - Agouram, Said

AU - Terwagne, Guy

A2 - Bodart, Franz

A2 - Bentham, eBooks

PY - 2013

Y1 - 2013

M3 - Chapter (peer-reviewed)

SN - 978-1-60805-157-1

SP - 133

EP - 162

BT - Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications

ER -

Agouram S, Terwagne G, Bodart F. Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. In Bentham EB, editor, Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. 2013. p. 133-162