TY - JOUR
T1 - Functionalization of MWCNTs with atomic nitrogen
AU - Ruelle, Benoit
AU - Felten, A.
AU - Ghijsen, J.
AU - Drube, Wolfgang
AU - Johnson, Robert L.
AU - Liang, Duoduo
AU - Erni, Rolf
AU - Van Tendeloo, Gustaaf
AU - Peeterbroek, Sophie
AU - Dubois, P.
AU - Godfroid, Thomas
AU - Hecq, Michel
AU - Bittencourt, Carla
PY - 2009/1/1
Y1 - 2009/1/1
N2 - In this study of the changes induced by exposing MWCNTs to a nitrogen plasma, it was found by HRTEM that the atomic nitrogen exposure does not significantly etch the surface of the carbon nanotube (CNT). Nevertheless, the atomic nitrogen generated by a microwave plasma effectively grafts amine, nitrile, amide, and oxime groups onto the CNT surface, as observed by XPS, altering the density of valence electronic states, as seen in UPS.
AB - In this study of the changes induced by exposing MWCNTs to a nitrogen plasma, it was found by HRTEM that the atomic nitrogen exposure does not significantly etch the surface of the carbon nanotube (CNT). Nevertheless, the atomic nitrogen generated by a microwave plasma effectively grafts amine, nitrile, amide, and oxime groups onto the CNT surface, as observed by XPS, altering the density of valence electronic states, as seen in UPS.
UR - http://www.scopus.com/inward/record.url?scp=54849440628&partnerID=8YFLogxK
U2 - 10.1016/j.micron.2008.01.003
DO - 10.1016/j.micron.2008.01.003
M3 - Article
AN - SCOPUS:54849440628
SN - 0968-4328
VL - 40
SP - 85
EP - 88
JO - Micron
JF - Micron
IS - 1
ER -