Fluorine and sulfur simultaneously co-doped suspended graphene

C Struzzi, H Sezen, M Amati, L Gregoratti, Nicolas Reckinger, Jean-François Colomer, R Snyders, C Bittencourt, M Scardamaglia

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Suspended graphene flakes are exposed simultaneously to fluorine and sulfur ions produced by the μ-wave plasma discharge of the SF 6 precursor gas. The microscopic and spectroscopic analyses, performed by Raman spectroscopy, scanning electron microscopy and photoelectron spectromicroscopy, show the homogeneity in functionalization yield over the graphene flakes with F and S atoms covalently bonded to the carbon lattice. This promising surface shows potential for several applications ranging from biomolecule immobilization to lithium battery and hydrogen storage devices. The present co-doping process is an optimal strategy to engineer the graphene surface with a concurrent hydrophobic character, thanks to the fluorine atoms, and a high affinity with metal nanoparticles due to the presence of sulfur atoms.

    Original languageEnglish
    Pages (from-to)104 - 110
    Number of pages7
    JournalApplied Surface Science
    Volume422
    DOIs
    Publication statusPublished - 15 Nov 2017

    Keywords

    • Co-doping
    • Fluorination
    • Raman
    • Spectromicroscopy
    • Suspended graphene
    • XPS

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