Fluorination of suspended graphene

Claudia Struzzi, Mattia Scardamaglia, Nicolas Reckinger, Jean-François Colomer, Hikmet Sezen, Matteo Amati, Luca Gregoratti, Rony Snyders, Carla Bittencourt

    Research output: Contribution to journalArticlepeer-review


    Suspended graphene is exposed to different fluorine-containing species produced by a plasma source fed with CF 4 precursor gas. We investigate the fluorination process by selecting two different kinetic energies for the ions striking the graphene surface. The chemical-bonding environment is discussed, and the control of the graphene-fluorination homogeneity is investigated at the individual graphene sheets. The modifications of the electronic and structural properties are examined by scanning photoelectron microscopy, micro-Raman analysis, and scanning electron microscopy. The results are compared with those obtained for supported graphene on copper. Suspended graphene provides a quasi-ideal model for investigating the intrinsic properties of irradiated carbon nano-systems while avoiding damage due to backscattered atoms and recoil due to a supporting substrate. [Figure not available: see fulltext.].

    Original languageEnglish
    Pages (from-to)3151-3163
    Number of pages13
    JournalNano Research
    Issue number9
    Publication statusPublished - 2017


    • Raman
    • X-ray photoelectron spectroscopy (XPS)
    • fluorination
    • graphene
    • scanning electron microscopy (SEM)
    • spectromicroscopy


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