Abstract
Some current fabrication technologies of SOI nano devices are reviewed in
this paper. By means of arsenic-assisted etching and oxidation effects, we have
fabricated several SOI nano devices: single-electron transistor, nano floating
gate memory device and cell, Ω-gate elevated source/drain MOSFET. The
application of this technique for fabricating a Schottky barrier MOSFET is
also presented.
this paper. By means of arsenic-assisted etching and oxidation effects, we have
fabricated several SOI nano devices: single-electron transistor, nano floating
gate memory device and cell, Ω-gate elevated source/drain MOSFET. The
application of this technique for fabricating a Schottky barrier MOSFET is
also presented.
Original language | English |
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Title of host publication | Science and Technology of Semiconductor-on-Insulator Structures and Devices Operating in a Harsh Environment |
Publication status | Published - 2005 |