Electrochemical stability enhancement in reactive magnetron sputtered VN films upon annealing treatment

Amine Achour, Mohammad Islam, Iftikhar Ahmad, Khalid Saeed, Shahram Solaymani

Research output: Contribution to journalArticle

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Abstract

Vanadium nitride (VN) thin films were produced via direct-current reactive magnetron sputtering technique followed by vacuum annealing. The treatment was carried out at different temperatures for any effect on their electrochemical (EC) stability, up to 10,000 charge-discharge cycles in 0.5 M K2SO4 solution. The film surface chemistry was investigated by using X-ray photoelectron spectroscope (XPS) and cyclic voltammetry (CV) techniques. For the as-deposited film, the oxide layer formed on the VN surface was unstable upon K2SO4 immersion treatment, along with ~23% reduction in the EC capacitance. Vacuum annealing under optimized conditions, however, made the oxide layer stable with almost no capacitance loss upon cycling for up to 10,000 cycles. Annealing treatment of the VN films makes them a potential candidate for long-term use in electrochemical capacitors.

Original languageEnglish
Article number72
JournalCoatings
Volume9
Issue number2
DOIs
Publication statusPublished - 1 Jan 2019

Fingerprint

Vanadium
Nitrides
vanadium
nitrides
Annealing
Oxides
cycles
annealing
augmentation
Capacitance
capacitance
Vacuum
vacuum
oxides
Reactive sputtering
electrochemical capacitors
Photoelectrons
Surface chemistry
Discharge (fluid mechanics)
Magnetron sputtering

Keywords

  • Cyclic voltammetry
  • Electrochemical capacitor
  • Vacuum annealing
  • VN films
  • XPS

Cite this

Achour, Amine ; Islam, Mohammad ; Ahmad, Iftikhar ; Saeed, Khalid ; Solaymani, Shahram. / Electrochemical stability enhancement in reactive magnetron sputtered VN films upon annealing treatment. In: Coatings. 2019 ; Vol. 9, No. 2.
@article{c87eb18250304b30a40f30b2a305d28b,
title = "Electrochemical stability enhancement in reactive magnetron sputtered VN films upon annealing treatment",
abstract = "Vanadium nitride (VN) thin films were produced via direct-current reactive magnetron sputtering technique followed by vacuum annealing. The treatment was carried out at different temperatures for any effect on their electrochemical (EC) stability, up to 10,000 charge-discharge cycles in 0.5 M K2SO4 solution. The film surface chemistry was investigated by using X-ray photoelectron spectroscope (XPS) and cyclic voltammetry (CV) techniques. For the as-deposited film, the oxide layer formed on the VN surface was unstable upon K2SO4 immersion treatment, along with ~23{\%} reduction in the EC capacitance. Vacuum annealing under optimized conditions, however, made the oxide layer stable with almost no capacitance loss upon cycling for up to 10,000 cycles. Annealing treatment of the VN films makes them a potential candidate for long-term use in electrochemical capacitors.",
keywords = "Cyclic voltammetry, Electrochemical capacitor, Vacuum annealing, VN films, XPS",
author = "Amine Achour and Mohammad Islam and Iftikhar Ahmad and Khalid Saeed and Shahram Solaymani",
year = "2019",
month = "1",
day = "1",
doi = "10.3390/COATINGS9020072",
language = "English",
volume = "9",
journal = "Coatings",
issn = "2079-6412",
publisher = "Multidisciplinary Digital Publishing Institute (MDPI)",
number = "2",

}

Electrochemical stability enhancement in reactive magnetron sputtered VN films upon annealing treatment. / Achour, Amine; Islam, Mohammad; Ahmad, Iftikhar; Saeed, Khalid; Solaymani, Shahram.

In: Coatings, Vol. 9, No. 2, 72, 01.01.2019.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Electrochemical stability enhancement in reactive magnetron sputtered VN films upon annealing treatment

AU - Achour, Amine

AU - Islam, Mohammad

AU - Ahmad, Iftikhar

AU - Saeed, Khalid

AU - Solaymani, Shahram

PY - 2019/1/1

Y1 - 2019/1/1

N2 - Vanadium nitride (VN) thin films were produced via direct-current reactive magnetron sputtering technique followed by vacuum annealing. The treatment was carried out at different temperatures for any effect on their electrochemical (EC) stability, up to 10,000 charge-discharge cycles in 0.5 M K2SO4 solution. The film surface chemistry was investigated by using X-ray photoelectron spectroscope (XPS) and cyclic voltammetry (CV) techniques. For the as-deposited film, the oxide layer formed on the VN surface was unstable upon K2SO4 immersion treatment, along with ~23% reduction in the EC capacitance. Vacuum annealing under optimized conditions, however, made the oxide layer stable with almost no capacitance loss upon cycling for up to 10,000 cycles. Annealing treatment of the VN films makes them a potential candidate for long-term use in electrochemical capacitors.

AB - Vanadium nitride (VN) thin films were produced via direct-current reactive magnetron sputtering technique followed by vacuum annealing. The treatment was carried out at different temperatures for any effect on their electrochemical (EC) stability, up to 10,000 charge-discharge cycles in 0.5 M K2SO4 solution. The film surface chemistry was investigated by using X-ray photoelectron spectroscope (XPS) and cyclic voltammetry (CV) techniques. For the as-deposited film, the oxide layer formed on the VN surface was unstable upon K2SO4 immersion treatment, along with ~23% reduction in the EC capacitance. Vacuum annealing under optimized conditions, however, made the oxide layer stable with almost no capacitance loss upon cycling for up to 10,000 cycles. Annealing treatment of the VN films makes them a potential candidate for long-term use in electrochemical capacitors.

KW - Cyclic voltammetry

KW - Electrochemical capacitor

KW - Vacuum annealing

KW - VN films

KW - XPS

UR - http://www.scopus.com/inward/record.url?scp=85068534442&partnerID=8YFLogxK

U2 - 10.3390/COATINGS9020072

DO - 10.3390/COATINGS9020072

M3 - Article

AN - SCOPUS:85068534442

VL - 9

JO - Coatings

JF - Coatings

SN - 2079-6412

IS - 2

M1 - 72

ER -