Dielectric effect on electric fields in the vicinity of the metal-vacuum-dielectric junction

Moon S Chung, Alexander Mayer, Nicholas Miskovsky, Brock L Weiss, Paul H Cutler

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Abstract

The dielectric effect was theoretically investigated in order to describe the electric field in the vicinity of a junction of a metal, dielectric, and vacuum. The assumption of two-dimensional symmetry of the junction leads to a simple analytic form and to a systematic numerical calculation for the field. The electric field obtained for the triple junction was found to be enhanced or reduced according to a certain criterion determined by the contact angles and dielectric constant. Further numerical calculations of the dielectric effect show that an electric field can experience a larger enhancement or reduction for a quadruple junction than that achieved for the triple junction. It was also found that even though it changes slowly in comparison with the shape effect, the dielectric effect was noticeably large over the entire range of the shape change.
Original languageEnglish
Pages (from-to)41-47
Number of pages7
JournalUltramicroscopy
Volume132
DOIs
Publication statusPublished - 1 Sep 2013

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