Detailed Atomistic Modeling of Si(110) Passivation by Atomic Layer Deposition of γAl2O3: Chapitre 11

Andrey Rybakov, Alexander Larin, Daniel P. Vercauteren, Georgii M. Zhidomirov

Research output: Contribution in Book/Catalog/Report/Conference proceedingChapter (peer-reviewed)peer-review

Original languageEnglish
Title of host publicationPractical Aspects of Computational Chemistry IV
EditorsJ. Leszczynski , M.K. Shukla
Place of PublicationNew York
Number of pages48
ISBN (Electronic)978-1-4899-7699-4
ISBN (Print)978-1-4899-7697-0
Publication statusPublished - 2016

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