Control of Radio Frequency plasma process to improve the reproducibility of silicon oxynitride thin films preparation

Deda Diatezua Manpuya, Paul Thiry, Roland Caudano

    Research output: Contribution to journalArticle

    Original languageFrench
    Pages (from-to)2099-2104
    Number of pages6
    JournalJournal of Vacuum Science and Technology A
    Volume13
    Issue number4
    Publication statusPublished - 1995

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