Control of Radio Frequency plasma process to improve the reproducibility of silicon oxynitride thin films preparation

Deda Diatezua Manpuya, Paul Thiry, Roland Caudano

Research output: Contribution to journal › Article

Original language	English
Pages (from-to)	2099-2104
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	13
Issue number	4
Publication status	Published - 1995

Cite this

@article{e23493f82ab74363b5140b4ac52c8bd0,

title = "Control of Radio Frequency plasma process to improve the reproducibility of silicon oxynitride thin films preparation",

author = "{Diatezua Manpuya}, Deda and Paul Thiry and Roland Caudano",

year = "1995",

language = "English",

volume = "13",

pages = "2099--2104",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "4",

}

TY - JOUR

T1 - Control of Radio Frequency plasma process to improve the reproducibility of silicon oxynitride thin films preparation

AU - Diatezua Manpuya, Deda

AU - Thiry, Paul

AU - Caudano, Roland

PY - 1995

Y1 - 1995

M3 - Article

SN - 0734-2101

VL - 13

SP - 2099

EP - 2104

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 4

ER -