Continuous deposition of organo-chlorinated thin films by atmospheric pressure dielectric barrier discharge in a wire-cylinder configuration

Cédric Vandenabeele, Rémy Maurau, Simon Bulou, Frederic Siffer, Mathieu Gérard, Thierry Belmonte, Patrick Choquet

Research output: Contribution to journalArticle

Abstract

On-line atmospheric pressure plasma treatment of cylindrical substrates is of great interest in tire industry in view of developing a cheaper and cleaner process than electrolytic plating ones that are applied on metallic tire reinforcing materials. Here we assess the feasibility of such a continuous treatment by depositing organochlorinated thin films from dichloromethane on zincplated steel wires crossing a tubular dielectric barrier discharge. We show that working conditions highly influence layers growth and have to be carefully adjusted for obtaining homogeneous and defect-free coatings. Thin films chemistry is strongly dependent on the energy injected in the discharge. Layers become more inorganic when power increases, resembling carbon black or graphite and no longer hydrocarbon.

Original languageEnglish
Pages (from-to)1089-1101
Number of pages13
JournalPlasma Processes and Polymers
Volume11
Issue number11
DOIs
Publication statusPublished - 21 Aug 2014
Externally publishedYes

Keywords

  • Continuous reactor
  • Cylindrical substrate
  • Dichloromethane
  • Dielectric barrier discharges (DBD)
  • Plasmaénhanced chemical vapor deposition (PE-CVD)

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