Comparative study of thin film physical properties for TiN(x) deposited by DC magnetron sputtering under temperatures less than 100°C on monocrystalline silicon and polycristalline iron substrates

Philippe Roquiny, A. Poulet, Y. Leys, J.-C. Descamps, Franz Bodart, P. Vandenbrande

    Research output: Contribution to journalArticle

    Original languageEnglish
    Pages (from-to)357-362
    Number of pages6
    JournalThin Solid Films
    Publication statusPublished - 1999

    Cite this