Characterisation of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air

Said Agouram, Franz Bodart, Guy Terwagne

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Abstract

The aim of this work is to study the stoichiometry of chromium oxynitride thin films deposited by reactive magnetron sputtering in presence of air with various relative humidities. Rutherford backscattering spectroscopy and resonant nuclear reaction (RNRA) were used to determine the thickness and the composition of the films. Hydrogen and nitrogen profiles were obtained by RNRA. The chemical bonds were investigated by X-ray photoemission spectroscopy and low energy electron induced X-ray spectroscopy. The chromium metallic and chromium compound concentrations were measured vs. the flow and relative humidity of the air. During sputtering in metallic mode, Cr2O3 stoichiometry is observed with low contents of CrN, CrO2 and (CrO2)3---N, whereas in compound mode the CrO2 stoichiometry predominates.
Original languageEnglish
Pages (from-to)164-168
Number of pages5
JournalSurface and Coatings Technology
Volume180-181
Publication statusPublished - 2004

Fingerprint

oxynitrides
Chromium
Stoichiometry
stoichiometry
chromium
Nuclear reactions
X ray spectroscopy
nuclear reactions
Thin films
humidity
air
Atmospheric humidity
thin films
Chromium Compounds
Air
chromium compounds
Chromium compounds
spectroscopy
Metallic compounds
Chemical bonds

Keywords

  • RNRA
  • Rutherford backscattering spectroscopy
  • Chromium oxynitride
  • Low energy electron induced X-ray spectroscopy
  • X-ray photoemission spectroscopy

Cite this

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title = "Characterisation of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air",
abstract = "The aim of this work is to study the stoichiometry of chromium oxynitride thin films deposited by reactive magnetron sputtering in presence of air with various relative humidities. Rutherford backscattering spectroscopy and resonant nuclear reaction (RNRA) were used to determine the thickness and the composition of the films. Hydrogen and nitrogen profiles were obtained by RNRA. The chemical bonds were investigated by X-ray photoemission spectroscopy and low energy electron induced X-ray spectroscopy. The chromium metallic and chromium compound concentrations were measured vs. the flow and relative humidity of the air. During sputtering in metallic mode, Cr2O3 stoichiometry is observed with low contents of CrN, CrO2 and (CrO2)3---N, whereas in compound mode the CrO2 stoichiometry predominates.",
keywords = "RNRA, Rutherford backscattering spectroscopy, Chromium oxynitride, Low energy electron induced X-ray spectroscopy, X-ray photoemission spectroscopy",
author = "Said Agouram and Franz Bodart and Guy Terwagne",
note = "Publication code : **RES. ACAD.",
year = "2004",
language = "English",
volume = "180-181",
pages = "164--168",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",

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TY - JOUR

T1 - Characterisation of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air

AU - Agouram, Said

AU - Bodart, Franz

AU - Terwagne, Guy

N1 - Publication code : **RES. ACAD.

PY - 2004

Y1 - 2004

N2 - The aim of this work is to study the stoichiometry of chromium oxynitride thin films deposited by reactive magnetron sputtering in presence of air with various relative humidities. Rutherford backscattering spectroscopy and resonant nuclear reaction (RNRA) were used to determine the thickness and the composition of the films. Hydrogen and nitrogen profiles were obtained by RNRA. The chemical bonds were investigated by X-ray photoemission spectroscopy and low energy electron induced X-ray spectroscopy. The chromium metallic and chromium compound concentrations were measured vs. the flow and relative humidity of the air. During sputtering in metallic mode, Cr2O3 stoichiometry is observed with low contents of CrN, CrO2 and (CrO2)3---N, whereas in compound mode the CrO2 stoichiometry predominates.

AB - The aim of this work is to study the stoichiometry of chromium oxynitride thin films deposited by reactive magnetron sputtering in presence of air with various relative humidities. Rutherford backscattering spectroscopy and resonant nuclear reaction (RNRA) were used to determine the thickness and the composition of the films. Hydrogen and nitrogen profiles were obtained by RNRA. The chemical bonds were investigated by X-ray photoemission spectroscopy and low energy electron induced X-ray spectroscopy. The chromium metallic and chromium compound concentrations were measured vs. the flow and relative humidity of the air. During sputtering in metallic mode, Cr2O3 stoichiometry is observed with low contents of CrN, CrO2 and (CrO2)3---N, whereas in compound mode the CrO2 stoichiometry predominates.

KW - RNRA

KW - Rutherford backscattering spectroscopy

KW - Chromium oxynitride

KW - Low energy electron induced X-ray spectroscopy

KW - X-ray photoemission spectroscopy

M3 - Article

VL - 180-181

SP - 164

EP - 168

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -