Certified ion implantation fluence by high accuracy RBS

Julien L. Colaux, Chris Jeynes, Keith C. Heasman, Russell M. Gwilliam

Research output: Contribution to journalArticlepeer-review

Abstract

From measurements over the last two years we have demonstrated that the charge collection system based on Faraday cups can robustly give near-1% absolute implantation fluence accuracy for our electrostatically scanned 200 kV Danfysik ion implanter, using four-point-probe mapping with a demonstrated accuracy of 2%, and accurate Rutherford backscattering spectrometry (RBS) of test implants from our quality assurance programme. The RBS is traceable to the certified reference material IRMM-ERM-EG001/BAM-L001, and involves convenient calibrations both of the electronic gain of the spectrometry system (at about 0.1% accuracy) and of the RBS beam energy (at 0.06% accuracy). We demonstrate that accurate RBS is a definitive method to determine quantity of material. It is therefore useful for certifying high quality reference standards, and is also extensible to other kinds of samples such as thin self-supporting films of pure elements. The more powerful technique of Total-IBA may inherit the accuracy of RBS.

Original languageEnglish
Pages (from-to)3251-3261
Number of pages11
JournalAnalyst
Volume140
Issue number9
DOIs
Publication statusPublished - 7 May 2015
Externally publishedYes

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