Carbon coatings with low secondary electron yield

P. Costa Pinto, S. Calatroni, H. Neupert, D. Letant-Delrieux, P. Edwards, P. Chiggiato, M. Taborelli, W. Vollenberg, C. Yin-Vallgren, J. L. Colaux, S. Lucas

Research output: Contribution to journalArticle

Abstract

Carbon thin films for electron cloud mitigation and anti-multipacting applications have been prepared by dc magnetron sputtering in both neon and argon discharge gases and by plasma enhanced chemical vapour deposition (PECVD) using acetylene. The thin films have been characterized using Secondary Electron Yield (SEY) measurements, Scanning Electron Microscopy (SEM), Nuclear Reaction Analysis (NRA) and X-ray Photoemission Spectroscopy (XPS). For more than 100 carbon thin films prepared by sputtering the average maximum SEY is 0.98 ± 0.07 after air transfer. The density of the films is lower than the density of Highly Oriented Pyrolytic Graphite (HOPG), a fact which partially explains their lower SEY. XPS shows that magnetron sputtered samples exhibit mainly sp2 type bonds. The intensity on the high binding energy side of C1s is found to be related to the value of the SEY. In addition the initial surface concentration of oxygen has no influence on the resulting SEY, when it is below 16%. The thin films produced by PECVD have a much higher maximum SEY of 1.49 ± 0.07. Storage conditions in air, namely wrapping in aluminium foil, preserves the low SEY by more than one year. Such coatings have already been applied successfully in accelerators and multipacting test benches.

Original languageEnglish
Pages (from-to)29-36
Number of pages8
JournalVacuum
Volume98
DOIs
Publication statusPublished - 9 Apr 2013

Fingerprint

Carbon
coatings
Coatings
Electrons
carbon
electrons
Thin films
thin films
Carbon films
Plasma enhanced chemical vapor deposition
Photoelectron spectroscopy
X ray spectroscopy
photoelectric emission
vapor deposition
electron clouds
Neon
pyrolytic graphite
air
Aluminum foil
Acetylene

Keywords

  • Carbon thin films
  • Dc magnetron sputtering
  • Secondary electron yield

Cite this

Costa Pinto, P., Calatroni, S., Neupert, H., Letant-Delrieux, D., Edwards, P., Chiggiato, P., ... Lucas, S. (2013). Carbon coatings with low secondary electron yield. Vacuum, 98, 29-36. https://doi.org/10.1016/j.vacuum.2013.03.001
Costa Pinto, P. ; Calatroni, S. ; Neupert, H. ; Letant-Delrieux, D. ; Edwards, P. ; Chiggiato, P. ; Taborelli, M. ; Vollenberg, W. ; Yin-Vallgren, C. ; Colaux, J. L. ; Lucas, S. / Carbon coatings with low secondary electron yield. In: Vacuum. 2013 ; Vol. 98. pp. 29-36.
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Costa Pinto, P, Calatroni, S, Neupert, H, Letant-Delrieux, D, Edwards, P, Chiggiato, P, Taborelli, M, Vollenberg, W, Yin-Vallgren, C, Colaux, JL & Lucas, S 2013, 'Carbon coatings with low secondary electron yield', Vacuum, vol. 98, pp. 29-36. https://doi.org/10.1016/j.vacuum.2013.03.001

Carbon coatings with low secondary electron yield. / Costa Pinto, P.; Calatroni, S.; Neupert, H.; Letant-Delrieux, D.; Edwards, P.; Chiggiato, P.; Taborelli, M.; Vollenberg, W.; Yin-Vallgren, C.; Colaux, J. L.; Lucas, S.

In: Vacuum, Vol. 98, 09.04.2013, p. 29-36.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Carbon coatings with low secondary electron yield

AU - Costa Pinto, P.

AU - Calatroni, S.

AU - Neupert, H.

AU - Letant-Delrieux, D.

AU - Edwards, P.

AU - Chiggiato, P.

AU - Taborelli, M.

AU - Vollenberg, W.

AU - Yin-Vallgren, C.

AU - Colaux, J. L.

AU - Lucas, S.

PY - 2013/4/9

Y1 - 2013/4/9

N2 - Carbon thin films for electron cloud mitigation and anti-multipacting applications have been prepared by dc magnetron sputtering in both neon and argon discharge gases and by plasma enhanced chemical vapour deposition (PECVD) using acetylene. The thin films have been characterized using Secondary Electron Yield (SEY) measurements, Scanning Electron Microscopy (SEM), Nuclear Reaction Analysis (NRA) and X-ray Photoemission Spectroscopy (XPS). For more than 100 carbon thin films prepared by sputtering the average maximum SEY is 0.98 ± 0.07 after air transfer. The density of the films is lower than the density of Highly Oriented Pyrolytic Graphite (HOPG), a fact which partially explains their lower SEY. XPS shows that magnetron sputtered samples exhibit mainly sp2 type bonds. The intensity on the high binding energy side of C1s is found to be related to the value of the SEY. In addition the initial surface concentration of oxygen has no influence on the resulting SEY, when it is below 16%. The thin films produced by PECVD have a much higher maximum SEY of 1.49 ± 0.07. Storage conditions in air, namely wrapping in aluminium foil, preserves the low SEY by more than one year. Such coatings have already been applied successfully in accelerators and multipacting test benches.

AB - Carbon thin films for electron cloud mitigation and anti-multipacting applications have been prepared by dc magnetron sputtering in both neon and argon discharge gases and by plasma enhanced chemical vapour deposition (PECVD) using acetylene. The thin films have been characterized using Secondary Electron Yield (SEY) measurements, Scanning Electron Microscopy (SEM), Nuclear Reaction Analysis (NRA) and X-ray Photoemission Spectroscopy (XPS). For more than 100 carbon thin films prepared by sputtering the average maximum SEY is 0.98 ± 0.07 after air transfer. The density of the films is lower than the density of Highly Oriented Pyrolytic Graphite (HOPG), a fact which partially explains their lower SEY. XPS shows that magnetron sputtered samples exhibit mainly sp2 type bonds. The intensity on the high binding energy side of C1s is found to be related to the value of the SEY. In addition the initial surface concentration of oxygen has no influence on the resulting SEY, when it is below 16%. The thin films produced by PECVD have a much higher maximum SEY of 1.49 ± 0.07. Storage conditions in air, namely wrapping in aluminium foil, preserves the low SEY by more than one year. Such coatings have already been applied successfully in accelerators and multipacting test benches.

KW - Carbon thin films

KW - Dc magnetron sputtering

KW - Secondary electron yield

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DO - 10.1016/j.vacuum.2013.03.001

M3 - Article

VL - 98

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EP - 36

JO - Vacuum

JF - Vacuum

SN - 0042-207X

ER -

Costa Pinto P, Calatroni S, Neupert H, Letant-Delrieux D, Edwards P, Chiggiato P et al. Carbon coatings with low secondary electron yield. Vacuum. 2013 Apr 9;98:29-36. https://doi.org/10.1016/j.vacuum.2013.03.001