C60 growth on Si(100), GaSe(0001) and GeS(001): Influence of the substrate on the film crystallinity

Georg Gensterblum, Li Ming Luo Yu, Jean-Jacques Pireaux, Paul Thiry, Roland Caudano, Jean Marc Themlin, Saidi Bouzidi, François COLETTI, Jean-Marie DEBEVER

Research output: Contribution to journalArticle

Abstract

C60 films have been grown in ultra high vacuum on various crystalline substrates and the structure of the films has been investigated by low energy electron diffraction (LEED) and high resolution electron energy loss spectroscopy (HREELS). The C60 films form randomly oriented nanocrystals on Si(100), mesoscopic polycrystals on GaSe(0001) and microscopic single crystals on GeS(001). The vibrational structure of the C60/substrate interfaces is analyzed in detail by HREELS carried out in the dipole and impact scattering regimes. It is shown that the epitaxy of C60 on GeS(001) is induced by the weak van der Waals bonding and the peculiar corrugation of the substrate surface.
Original languageEnglish
Pages (from-to)175-183
Number of pages9
JournalApplied physics. A: Solids and surfaces
Volume56
Issue number3
DOIs
Publication statusPublished - 1993

Fingerprint

Dive into the research topics of 'C60 growth on Si(100), GaSe(0001) and GeS(001): Influence of the substrate on the film crystallinity'. Together they form a unique fingerprint.

Cite this