Ar transport and blister growth kinetics in titania-doped germania-based optical coatings

Emile Lalande; Aaron Davenport; Lory Marchand; Ashot  Markosyan; Daniel Martinez; Annalisa Paolone; Michael Rezac; Marco Bazzan; Martin Chicoine; Julien Colaux; Matthieu Coulon; Martin M. Fejer; Alexandre W. Lussier; Ettore Majorana; Ludvik Martinu; Carmen Menoni; Christophe Michel; Fulvio Ricci; François Schiettekatte; Nikita Shcheblanov; Joshua R. Smith; Julien Teillon; Guy Terwagne; Gabriele Vajente

doi:10.1088/1361-6382/ad3ffb

Ar transport and blister growth kinetics in titania-doped germania-based optical coatings

Emile Lalande, Aaron Davenport, Lory Marchand, Ashot Markosyan, Daniel Martinez, Annalisa Paolone, Michael Rezac, Marco Bazzan, Martin Chicoine, Julien Colaux, Matthieu Coulon, Martin M. Fejer, Alexandre W. Lussier, Ettore Majorana, Ludvik Martinu, Carmen Menoni, Christophe Michel, Fulvio Ricci, François Schiettekatte, Nikita ShcheblanovJoshua R. Smith, Julien Teillon, Guy Terwagne, Gabriele Vajente

Namur Institute of Structured Matter

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Abstract

Blistering is a phenomenon sometimes observed in sputtered-deposited thin films but seldom investigated in detail. Here, we consider the case of titania-doped germania (TGO)/silica multilayers deposited by ion beam sputtering. TGO is a candidate as high refractive index material in the Bragg mirrors for the next iteration of gravitational waves detectors. It needs to be annealed at 600 ^∘C for 100 h in order to reach the desired relaxation state. However under some growth conditions, in 52-layer TGO/silica stacks, blistering occurs upon annealing at a temperature near 500 ^∘C, which corresponds to the temperature where Ar desorbs from TGO. In order to better understand the blistering phenomenon, we measure the Ar transport in single layers of TGO and silica. In the case of < 1 µm-thick TGO layers, the Ar desorption is mainly limited by detrapping. The transport model also correctly predicts the evolution of the total amount of Ar in a 8.5 µm stack of TGO and silica layers annealed at 450 ^∘C, but in that case, the process is mainly limited by diffusion. Since Ar diffusion is an order of magnitude slower in TGO compared to silica, we observe a correspondingly strong accumulation of Ar in TGO. The Ar transport model is used to explain some regimes of the blisters growth, and we find indications that Ar accumulation is a driver for their growth in general, but the blisters nucleation remains a complex phenomenon influenced by several other factors including stress, substrate roughness, and impurities.

Original language	English
Article number	115013
Journal	Classical and Quantum Gravity
Volume	41
Issue number	11
DOIs	https://doi.org/10.1088/1361-6382/ad3ffb
Publication status	Published - 6 Jun 2024

Funding

The work performed at UdeM and Polytechnique Montr\u00E9al was supported by the Natural Sciences and Engineering Research Council of Canada (NSERC), the Canadian foundation for innovation (CFI) and the Fonds de recherche Qu\u00E9bec, Nature et technologies (FQRNT) through the Regroupement Qu\u00E9b\u00E9cois sur les Mat\u00E9riaux de Pointe (RQMP), as well as a Projet de coop\u00E9ration Qu\u00E9bec-Wallonie-Bruxelles (Wallonie: #RECH-INNO-02, Qu\u00E9bec: #11.802). The authors thank Prof. S Roorda and F Debris from U Montr\u00E9al for fruitful discussions and technical support. Cal State Fullerton authors were supported by NSF Awards PHY-2207998 and PHY-1807069, the Dan Black Family Trust, and Nancy and Lee Begovich. The authors thank their colleagues within the LIGO Scientific Collaboration for advice and support. LIGO was constructed by the California Institute of Technology and Massachusetts Institute of Technology with funding from the National Science Foundation, and operates under cooperative Agreement PHY-0757058. Advanced LIGO was built under Award PHY-0823459. This paper has LIGO Document Number LIGO-P2300328.

Funders	Funder number
Massachusetts Institute of Technology
Canada Foundation for Innovation
Fonds de recherche du Québec – Nature et technologies
Natural Sciences and Engineering Research Council of Canada
Dan Black Family Trust
Fonds Québécois de la Recherche sur la Nature et les Technologies
Nancy and Lee Begovich
National Science Foundation	PHY-0823459, PHY-2207998, LIGO-P2300328, PHY-0757058, PHY-1807069
National Science Foundation
Regroupement Québécois sur les Matériaux de Pointe	11.802, INNO-02

Keywords

annealing
argon
blistering
bragg reflector
ion beam analysis
scatterometer
thermal desorption

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10.1088/1361-6382/ad3ffb

lalande+et+al_2024_Class._Quantum_Grav._10.1088_1361-6382_ad3ffbAccepted author manuscript, 3.88 MB

Cite this

Lalande, E., Davenport, A., Marchand, L., Markosyan, A., Martinez, D., Paolone, A., Rezac, M., Bazzan, M., Chicoine, M., Colaux, J., Coulon, M., Fejer, M. M., Lussier, A. W., Majorana, E., Martinu, L., Menoni, C., Michel, C., Ricci, F., Schiettekatte, F., ... Vajente, G. (2024). Ar transport and blister growth kinetics in titania-doped germania-based optical coatings. Classical and Quantum Gravity , 41(11), Article 115013. https://doi.org/10.1088/1361-6382/ad3ffb

@article{9145ed334d834adaa954a9967255765a,

title = "Ar transport and blister growth kinetics in titania-doped germania-based optical coatings",

abstract = "Blistering is a phenomenon sometimes observed in sputtered-deposited thin films but seldom investigated in detail. Here, we consider the case of titania-doped germania (TGO)/silica multilayers deposited by ion beam sputtering. TGO is a candidate as high refractive index material in the Bragg mirrors for the next iteration of gravitational waves detectors. It needs to be annealed at 600 ∘C for 100 h in order to reach the desired relaxation state. However under some growth conditions, in 52-layer TGO/silica stacks, blistering occurs upon annealing at a temperature near 500 ∘C, which corresponds to the temperature where Ar desorbs from TGO. In order to better understand the blistering phenomenon, we measure the Ar transport in single layers of TGO and silica. In the case of < 1 µm-thick TGO layers, the Ar desorption is mainly limited by detrapping. The transport model also correctly predicts the evolution of the total amount of Ar in a 8.5 µm stack of TGO and silica layers annealed at 450 ∘C, but in that case, the process is mainly limited by diffusion. Since Ar diffusion is an order of magnitude slower in TGO compared to silica, we observe a correspondingly strong accumulation of Ar in TGO. The Ar transport model is used to explain some regimes of the blisters growth, and we find indications that Ar accumulation is a driver for their growth in general, but the blisters nucleation remains a complex phenomenon influenced by several other factors including stress, substrate roughness, and impurities.",

keywords = "annealing, argon, blistering, bragg reflector, ion beam analysis, scatterometer, thermal desorption",

author = "Emile Lalande and Aaron Davenport and Lory Marchand and Ashot Markosyan and Daniel Martinez and Annalisa Paolone and Michael Rezac and Marco Bazzan and Martin Chicoine and Julien Colaux and Matthieu Coulon and Fejer, \{Martin M.\} and Lussier, \{Alexandre W.\} and Ettore Majorana and Ludvik Martinu and Carmen Menoni and Christophe Michel and Fulvio Ricci and Fran{\c c}ois Schiettekatte and Nikita Shcheblanov and Smith, \{Joshua R.\} and Julien Teillon and Guy Terwagne and Gabriele Vajente",

note = "Publisher Copyright: {\textcopyright} 2024 The Author(s). Published by IOP Publishing Ltd.",

year = "2024",

month = jun,

day = "6",

doi = "10.1088/1361-6382/ad3ffb",

language = "English",

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Lalande, E, Davenport, A, Marchand, L, Markosyan, A, Martinez, D, Paolone, A, Rezac, M, Bazzan, M, Chicoine, M, Colaux, J, Coulon, M, Fejer, MM, Lussier, AW, Majorana, E, Martinu, L, Menoni, C, Michel, C, Ricci, F, Schiettekatte, F, Shcheblanov, N, Smith, JR, Teillon, J, Terwagne, G & Vajente, G 2024, 'Ar transport and blister growth kinetics in titania-doped germania-based optical coatings', Classical and Quantum Gravity , vol. 41, no. 11, 115013. https://doi.org/10.1088/1361-6382/ad3ffb

TY - JOUR

T1 - Ar transport and blister growth kinetics in titania-doped germania-based optical coatings

AU - Lalande, Emile

AU - Davenport, Aaron

AU - Marchand, Lory

AU - Markosyan, Ashot

AU - Martinez, Daniel

AU - Paolone, Annalisa

AU - Rezac, Michael

AU - Bazzan, Marco

AU - Chicoine, Martin

AU - Colaux, Julien

AU - Coulon, Matthieu

AU - Fejer, Martin M.

AU - Lussier, Alexandre W.

AU - Majorana, Ettore

AU - Martinu, Ludvik

AU - Menoni, Carmen

AU - Michel, Christophe

AU - Ricci, Fulvio

AU - Schiettekatte, François

AU - Shcheblanov, Nikita

AU - Smith, Joshua R.

AU - Teillon, Julien

AU - Terwagne, Guy

AU - Vajente, Gabriele

PY - 2024/6/6

Y1 - 2024/6/6

N2 - Blistering is a phenomenon sometimes observed in sputtered-deposited thin films but seldom investigated in detail. Here, we consider the case of titania-doped germania (TGO)/silica multilayers deposited by ion beam sputtering. TGO is a candidate as high refractive index material in the Bragg mirrors for the next iteration of gravitational waves detectors. It needs to be annealed at 600 ∘C for 100 h in order to reach the desired relaxation state. However under some growth conditions, in 52-layer TGO/silica stacks, blistering occurs upon annealing at a temperature near 500 ∘C, which corresponds to the temperature where Ar desorbs from TGO. In order to better understand the blistering phenomenon, we measure the Ar transport in single layers of TGO and silica. In the case of < 1 µm-thick TGO layers, the Ar desorption is mainly limited by detrapping. The transport model also correctly predicts the evolution of the total amount of Ar in a 8.5 µm stack of TGO and silica layers annealed at 450 ∘C, but in that case, the process is mainly limited by diffusion. Since Ar diffusion is an order of magnitude slower in TGO compared to silica, we observe a correspondingly strong accumulation of Ar in TGO. The Ar transport model is used to explain some regimes of the blisters growth, and we find indications that Ar accumulation is a driver for their growth in general, but the blisters nucleation remains a complex phenomenon influenced by several other factors including stress, substrate roughness, and impurities.

AB - Blistering is a phenomenon sometimes observed in sputtered-deposited thin films but seldom investigated in detail. Here, we consider the case of titania-doped germania (TGO)/silica multilayers deposited by ion beam sputtering. TGO is a candidate as high refractive index material in the Bragg mirrors for the next iteration of gravitational waves detectors. It needs to be annealed at 600 ∘C for 100 h in order to reach the desired relaxation state. However under some growth conditions, in 52-layer TGO/silica stacks, blistering occurs upon annealing at a temperature near 500 ∘C, which corresponds to the temperature where Ar desorbs from TGO. In order to better understand the blistering phenomenon, we measure the Ar transport in single layers of TGO and silica. In the case of < 1 µm-thick TGO layers, the Ar desorption is mainly limited by detrapping. The transport model also correctly predicts the evolution of the total amount of Ar in a 8.5 µm stack of TGO and silica layers annealed at 450 ∘C, but in that case, the process is mainly limited by diffusion. Since Ar diffusion is an order of magnitude slower in TGO compared to silica, we observe a correspondingly strong accumulation of Ar in TGO. The Ar transport model is used to explain some regimes of the blisters growth, and we find indications that Ar accumulation is a driver for their growth in general, but the blisters nucleation remains a complex phenomenon influenced by several other factors including stress, substrate roughness, and impurities.

KW - annealing

KW - argon

KW - blistering

KW - bragg reflector

KW - ion beam analysis

KW - scatterometer

KW - thermal desorption

UR - https://www.scopus.com/pages/publications/85192995763

U2 - 10.1088/1361-6382/ad3ffb

DO - 10.1088/1361-6382/ad3ffb

M3 - Article

SN - 0264-9381

VL - 41

JO - Classical and Quantum Gravity

JF - Classical and Quantum Gravity

IS - 11

M1 - 115013

ER -

Ar transport and blister growth kinetics in titania-doped germania-based optical coatings

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