Analysis of silicides formation for Schottky barrier contacts applications

J. Katcki; J. Ratajczak; A. Laszcz; A. Czerwinski; Nicolas Reckinger; X. Tang; G. Larrieu; N. Breil; D.A. Yarekha; E. Dubois

Analysis of silicides formation for Schottky barrier contacts applications

J. Katcki, J. Ratajczak, A. Laszcz, A. Czerwinski, Nicolas Reckinger, X. Tang, G. Larrieu, N. Breil, D.A. Yarekha, E. Dubois

Research output: Contribution in Book/Catalog/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	7th Polish-Japanese Joint Seminar on Micro and Nano Analysis
Publication status	Published - 2008

Cite this

@inproceedings{8ad13494bbbf407791382aab18fed2b0,

title = "Analysis of silicides formation for Schottky barrier contacts applications",

author = "J. Katcki and J. Ratajczak and A. Laszcz and A. Czerwinski and Nicolas Reckinger and X. Tang and G. Larrieu and N. Breil and D.A. Yarekha and E. Dubois",

year = "2008",

language = "English",

booktitle = "7th Polish-Japanese Joint Seminar on Micro and Nano Analysis",

}

TY - GEN

T1 - Analysis of silicides formation for Schottky barrier contacts applications

AU - Katcki, J.

AU - Ratajczak, J.

AU - Laszcz, A.

AU - Czerwinski, A.

AU - Reckinger, Nicolas

AU - Tang, X.

AU - Larrieu, G.

AU - Breil, N.

AU - Yarekha, D.A.

AU - Dubois, E.

PY - 2008

Y1 - 2008

M3 - Conference contribution

BT - 7th Polish-Japanese Joint Seminar on Micro and Nano Analysis

ER -